Ion implantation for deterministic single atom devices
We demonstrate a capability of deterministic doping at the single atom level using a
combination of direct write focused ion beam and solid-state ion detectors. The focused ion …
combination of direct write focused ion beam and solid-state ion detectors. The focused ion …
Single‐Ion Implantation for the Development of Si‐Based MOSFET Devices with Quantum Functionalities
JC McCallum, DN Jamieson, C Yang… - … in Materials Science …, 2012 - Wiley Online Library
Interest in single‐ion implantation is driven in part by research into development of solid‐
state devices that exhibit quantum behaviour in their electronic or optical characteristics …
state devices that exhibit quantum behaviour in their electronic or optical characteristics …
Guided assembly of gold colloidal nanoparticles on silicon substrates prepatterned by charged particle beams
M Kolibal, M Konecny, F Ligmajer, D Skoda… - ACS …, 2012 - ACS Publications
Colloidal gold nanoparticles represent technological building blocks which are easy to
fabricate while keeping full control of their shape and dimensions. Here, we report on a …
fabricate while keeping full control of their shape and dimensions. Here, we report on a …
Near-surface electrical characterization of silicon electronic devices using focused keV-range ions
The demonstration of universal quantum logic operations near the fault-tolerance threshold
has established ion-implanted near-surface donor atoms as a plausible platform for scalable …
has established ion-implanted near-surface donor atoms as a plausible platform for scalable …
Evaluation of the accuracy of stopping and range of ions in matter simulations through secondary ion mass spectrometry and Rutherford backscattering spectrometry …
M Titze, JL Pacheco, T Byers… - Journal of Vacuum …, 2021 - pubs.aip.org
The freely available “Stopping and Range of Ions in Matter”(SRIM) code is used for
evaluating ion beam ranges and depth profiles. We present secondary ion mass …
evaluating ion beam ranges and depth profiles. We present secondary ion mass …
Single ion implantation for single donor devices using Geiger mode detectors
E Bielejec, JA Seamons, MS Carroll - Nanotechnology, 2010 - iopscience.iop.org
Electronic devices that are designed to use the properties of single atoms such as donors or
defects have become a reality with recent demonstrations of donor spectroscopy, single …
defects have become a reality with recent demonstrations of donor spectroscopy, single …
Precision pulse shape simulation for proton detection at the Nab experiment
The Nab experiment at Oak Ridge National Laboratory, USA, aims to measure the beta-
antineutrino angular correlation following neutron β decay to an anticipated precision of …
antineutrino angular correlation following neutron β decay to an anticipated precision of …
Transient processes induced by heavy projectiles in silicon
I Lazanu, S Lazanu - Nuclear Instruments and Methods in Physics …, 2010 - Elsevier
The thermal spike model developed for the electronic stopping power regime is extended to
consider both ionization and nuclear energy loss processes of the projectile as electronic …
consider both ionization and nuclear energy loss processes of the projectile as electronic …
Investigation of avalanche silicon detectors for low energy single ion implantation applications
C Yang, D Jamieson - Nuclear Instruments and Methods in Physics …, 2010 - Elsevier
Avalanche silicon photodiodes have potential applications to detect low energy single ions
for counting single ion impacts in shallow implant depths for the deterministic doping of …
for counting single ion impacts in shallow implant depths for the deterministic doping of …