We have realized the first demonstration of a table-top aerial imaging microscope capable of
characterizing pattern and defect printability in extreme ultraviolet lithography masks. The …

In this study, the phenomenon of particulate contamination of heated wafers contained in a
closed environment like the front opening unified pod (FOUP), which is a fundamental …

The Gaussian Diffusion Sphere Model (GDSM) was developed and improved to reflect the
effects of gravitational settling as well as Brownian diffusion of aerosol particles on …

Thermophoresis can affect the particulate contamination of wafers and photomasks.
Thermophoretic effect on particle deposition velocity in the cleanroom environment has …

Wafers and photomasks in the cleanroom are exposed to airflows not only vertical but also
parallel to the surfaces. In this study, Gaussian Diffusion Sphere Model (GDSM) was …

Particulate contamination is one of the critical problems that decrease product yield in
semiconductor manufacturing. It is therefore important to quickly and correctly predict the …

The effect of plate thickness on particle deposition velocity onto a face-up flat plate in a
parallel airflow was examined both numerically and experimentally. Plate thickness was …

Deposition velocity of charged particles onto a horizontal flat plate in parallel airflow in the
presence of an electric field was numerically investigated by employing a Lagrangian …

In extreme ultraviolet lithography (EUVL), conventional pellicles are unavailable for
protecting the EUVL masks, since they highly absorb the EUV radiation. One of the serious …

Extreme ultraviolet lithography (EUVL) masks are vulnerable to particulate contamination
due to the unavailability of pellicles. Particle deposition velocity is used to assess the level of …