Atomic layer deposition (ALD) is a popular deposition technique comprising two or more
sequential, self-limiting surface reactions, which make up an ALD cycle. Energy-enhanced …

In this review, key aspects of the surface chemistry associated with atomic layer deposition
(ALD) are discussed. It is argued that, in spite of its central role in defining the efficacy of …

An integrated memory cell with a memristor and a trilayer crested barrier selector, showing
repeatable nonlinear current–voltage switching loops is presented. The fully atomic‐layer …

Photoelectrochemical water splitting is one of many approaches being studied to harvest
sunlight and produce renewable H2. Tantalum nitride (Ta3N5) is a promising photoanode …

Tantalum nitride is a promising photoanode material for solar water splitting, but further
study and practical use are constrained by the harsh conditions of the synthesis from Ta …

Photocatalytic water splitting, which directly converts solar energy into hydrogen, is one of
the most desirable solar-energy-conversion approaches. The ultimate target of …

Tantalum nitride, Ta3N5, is one of the most promising materials for solar energy driven water
oxidation. One significant challenge of this material is the high temperature and long …

The development of a reliable synthetic route to produce high performance Ta3N5
photoanodes has been complicated by the large number of synthetic parameters, notably …

The phase stability, mechanical properties and metallic properties of tantalum nitrides are
extensively studied by means of first principles calculations. The relationship between …

By reactive DC magnetron sputtering from a pure Ta target onto silicon substrates, Ta (N)
films were prepared with different N2 flow rates of 0, 12, 17, 25, 38, and 58 sccm. The effects …