Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous
reactants and an exposed solid surface to deposit highly conformal coatings with a thickness …

Atomic layer deposition (ALD) represents a unique deposition technique that allows to coat
uniformly various high aspect ratio (HAR) porous nanostructures, in addition to its traditional …

Due to concerns on resources depletion, climate change, and overall pollution, the quest
toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a …

Vertically aligned carbon nanotubes (VACNTs) exhibit outstanding mechanical strength,
chemical stability, and electrical characteristics; however, their constrained mechanical …

This work presents a diffusion–reaction model for atomic layer deposition (ALD), which has
been adapted to describe radial direction reactant transport and adsorption kinetics in a …

Due to its excellent conformality, atomic layer deposition (ALD) has become a key method
for coating and functionalizing three dimensional (3D) large surface area structures such as …

Controlled deposition of thin conformal oxide films on carbon nanotubes (CNTs) by atomic
layer deposition (ALD) for applications in solar energy and photocatalysis is still challenging …

Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry
were fabricated by using an innovative approach of microcasting: hot embossing technology …

Atomic layer deposition (ALD) can be used to coat high aspect ratio and high surface area
substrates with conformal and precisely controlled thin films. Vertically aligned arrays of …

Atmospheric-pressure spatial atomic layer deposition (s-ALD) has emerged as a scalable
deposition technique combining the advantages of ALD with high deposition rates, suitable …