The mechanism of electron density and temperature being influenced by a magnetic field
and a grid is studied through inductively coupled Ar plasma discharge simulations and …

Featured Application In various microwave plasma fields, such as Microwave Plasma
Chemical Vapor Deposition (MPCVD), the dual-frequency plasma source could be used to …

为探究坑道聚焦直流激电法电流场分布特性及其探测影响因素, 利用有限单元法对空间场正常
电位和异常电位进行求解, 基于Comsol 软件构建均质三维地电探测模型 …

In this article, a 2-D fluid simulation model of a coaxial cylindrical DBD reactor filled with
single solid spheres of two different materials is developed for plasma-assisted milling …

This paper presents the physical characteristics of 2D and 3D simulation of inductively
coupled plasma (ICP) discharge with varying designs of copper coil. The inductive coil gaps …

Inductively coupled plasma (ICP) is widely used in applications such as material processing
and microelectronic device fabrication. However, their electromagnetic properties have not …

By studying the basic principle of ICP and the characteristics of low-temperature plasma, the
advantages of using a plasma metal cylinder discharge chamber are discussed, and the …