Low dielectric constant film materials with improved elastic modulus. The method of making
such film materials involves providing a porous methyl silsesquioxane based dielectric film …

US7205248B2 - Method of eliminating residual carbon from flowable oxide fill - Google Patents
US7205248B2 - Method of eliminating residual carbon from flowable oxide fill - Google Patents …

The invention forms a graded modified layer in a Substrate by exposing the Substrate to
hydrogen plasma. Methyl groups may be removed from carbon doped oxide in the Substrate …

(63) Continuation of application No. 09/247.381, filed on Feb. 10, 1999, now Pat. No.
6,348,725, which is a continuation-(List continued on next page.) in-part of application No …

It is an object to provide a composite in which the adhesion between a sheet layer and a
curable resin layer or a film layer is high, and which has high strength and high …

According to the present invention, disadvantages and problems associated with previous
integrated circuit Struc tures have been Substantially reduced or eliminated. According to …

A method and apparatus for depositing a low dielectric constant film by reaction of an
organosilane or organosiloxane compound and an oxidizing gas at a low RF power level …

A method and apparatus for depositing a low dielectric constant film by reaction of an
organosilicon compound and an oxidizing gas at a constant RF power level from about 10W …

6,176,198 B1 1/2001 Kao et al............ 118/723 ME EP 0 840 365 5/1998......... H01L/21/311
6,238,751 B1 5/2001 Mountsier....... 427/574 EP 0 849 789 6/1998.. H01L/21/768 6,245,690 …

Methods are provided for depositing a dielectric material. The dielectric material may be
used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for …