Stability and reliability of lateral GaN power field-effect transistors
JA Del Alamo, ES Lee - IEEE Transactions on Electron Devices, 2019 - ieeexplore.ieee.org
GaN electronics constitutes a revolutionary technology with power handling capabilities that
amply exceed those of Si and other semiconductors in many applications. RF, microwave …
amply exceed those of Si and other semiconductors in many applications. RF, microwave …
Chip-level thermal management in GaN HEMT: Critical review on recent patents and inventions
MF Abdullah, MRM Hussin, MA Ismail… - Microelectronic …, 2023 - Elsevier
The technological development of GaN high electron mobility transistor (HEMT) is on the
right track to compete with Si and SiC-based power transistors for the market segment of> …
right track to compete with Si and SiC-based power transistors for the market segment of> …
Ti3C2Tx MXene van der Waals Gate Contact for GaN High Electron Mobility Transistors
Gate controllability is a key factor that determines the performance of GaN high electron
mobility transistors (HEMTs). However, at the traditional metal‐GaN interface, direct …
mobility transistors (HEMTs). However, at the traditional metal‐GaN interface, direct …
Opportunities in single event effects in radiation-exposed SiC and GaN power electronics
Radiation effects have a critical impact on the reliability of SiC and GaN power electronics
and must be understood for space and avionics applications involving exposure to various …
and must be understood for space and avionics applications involving exposure to various …
Comprehensive Schottky barrier height behavior and reliability instability with Ni/Au and Pt/Ti/Pt/Au on AlGaN/GaN high-electron-mobility transistors
S Chakraborty, TW Kim - Micromachines, 2022 - mdpi.com
The reliability instability of inhomogeneous Schottky contact behaviors of Ni/Au and
Pt/Ti/Pt/Au gate contacts on AlGaN/GaN high-electron-mobility transistors (HEMTs) was …
Pt/Ti/Pt/Au gate contacts on AlGaN/GaN high-electron-mobility transistors (HEMTs) was …
Trapping in GaN-based metal-insulator-semiconductor transistors: Role of high drain bias and hot electrons
This paper describes an extensive analysis of the role of off-state and semi-on state bias in
inducing the trapping in GaN-based power High Electron Mobility Transistors. The study is …
inducing the trapping in GaN-based power High Electron Mobility Transistors. The study is …
AlGaN/GaN high electron mobility transistors on semi-insulating Ammono-GaN substrates with regrown ohmic contacts
W Wojtasiak, M Góralczyk, D Gryglewski, M Zając… - Micromachines, 2018 - mdpi.com
AlGaN/GaN high electron mobility transistors on semi-insulating bulk ammonothermal GaN
have been investigated. By application of regrown ohmic contacts, the problem with …
have been investigated. By application of regrown ohmic contacts, the problem with …
The impact of dislocations on AlGaN/GaN Schottky diodes and on gate failure of high electron mobility transistors
S Besendörfer, E Meissner, F Medjdoub, J Derluyn… - Scientific reports, 2020 - nature.com
GaN epitaxially grown on Si is a material for power electronics that intrinsically shows a high
density of dislocations. We show by Conductive Atomic Force Microscopy (C-AFM) and …
density of dislocations. We show by Conductive Atomic Force Microscopy (C-AFM) and …
Failure Physics and Reliability of GaN‐Based HEMTs for Microwave and Millimeter‐Wave Applications: A Review of Consolidated Data and Recent Results
Herein, the results are reviewed concerning reliability of high‐electron mobility transistors
(HEMTs) based on GaN, which currently represent the technology of choice for high …
(HEMTs) based on GaN, which currently represent the technology of choice for high …
Structural refinement, optical and ferroelectric properties of microcrystalline Ba (Zr0. 05Ti0. 95) O3 perovskite
For this study, a microcrystalline Ba (Zr 0.05 Ti 0.95) O 3 (BZT) powder was prepared by a
high energy ball milling method followed by calcination at 1100° C for 4 h. The calcined …
high energy ball milling method followed by calcination at 1100° C for 4 h. The calcined …