Biaxially aligned thin films have not only a preferential crystallographic out-of-plane
orientation, but also have an alignment along a certain reference direction parallel to the …

The growth of reactively sputtered TiN films is discussed. First, an overview of the existing
models in the literature that describe the development of the orientation and microstructure …

Ion bombardment during film growth usually induces high compressive stress in compound
thin film materials, resulting in rupture and failure of coated tools used in tribological …

In this study, the structural characteristics of TiN coatings deposited by DC magnetron
sputtering on the surface of AISI 304 stainless steel were modulated by performing …

Chromium nitride coatings were deposited by DC and RF reactive magnetron sputtering on
AISI 304 stainless steels without substrate heating. A Cr2N phase was formed in the RF …

Texture control of sputter-deposited nitride films has provoked a great deal of interest due to
its technological importance. However, to our knowledge, studies on the influence of the …

In this study, TiVCr and TiVCrZrY films were deposited on Si substrates by magnetron
sputtering with the application of radio-frequency substrate bias of different powers from 0 to …

In situ wafer curvature measurements have been conducted on sputter-deposited nitride
films (TiN, ZrN) to investigate the effect of growth rate and pressure on stress. For each …

Five TiCrBN coatings have been successfully fabricated by adopting hybrid co-deposition
and superimposition concepts into high power impulse magnetron sputtering. The medium …

Titanium nitride (TiN) films are prepared by direct current (DC) magnetron sputtering of a
titanium (Ti) target in an argon (Ar)+ nitrogen (N 2) atmosphere on bare and pulsed DC …