Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous
reactants and an exposed solid surface to deposit highly conformal coatings with a thickness …

Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic
scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts …

Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise
design and synthesis of catalytic materials. Herein, we discuss examples in which the atomic …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Development at the nanoscale has established diverse and complex structures with the help
of a growing selection of materials to choose from. Among the major developments that has …

The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

Atomic layer deposition (ALD) is a popular deposition technique comprising two or more
sequential, self-limiting surface reactions, which make up an ALD cycle. Energy-enhanced …

Deposition of thin films with desired compositions, conformality and bonding to substrates is
a key component in nanotechnology research. The growth of metal films by atomic layer …

Unparalleled conformality is driving ever new applications for atomic layer deposition (ALD),
a thin film growth method based on repeated self-terminating gas–solid reactions. In this …