Metal monolayer deposition by replacement of metal adlayers on electrode surfaces

SR Brankovic, JX Wang, RR Adžić - Surface Science, 2001 - Elsevier
A new metal deposition method is demonstrated by deposition of a submonolayer of Pt, a
monolayer of Pd and a bilayer of Ag on Au (111) surfaces by using a Cu adlayer as a …

Recent advances in the growth of metals, alloys, and multilayers by surface limited redox replacement (SLRR) based approaches

N Dimitrov - Electrochimica acta, 2016 - Elsevier
In the realm of ever increasing importance of nanotechnology, the deposition of ultrathin
metal/alloy layers with perfect structure and unique functionality becomes an objective of …

Epitaxial growth of Cu on Au (111) and Ag (111) by surface limited redox replacement an electrochemical and STM study

LT Viyannalage, R Vasilic… - The Journal of Physical …, 2007 - ACS Publications
The growth of ultrathin copper films by surface limited redox replacement is discussed and
experimentally illustrated. Cyclic voltammetry, in situ scanning tunneling microscopy (STM) …

Stoichiometry of Pt submonolayer deposition via surface-limited redox replacement reaction

D Gokcen, SE Bae, SR Brankovic - Journal of the Electrochemical …, 2010 - iopscience.iop.org
The work exploring the stoichiometry of Pt deposition via surface-limited redox replacement
of the underpotentially deposited (UPD) Cu monolayer on Au (111) is presented. The Cu …

The impact of electrocrystallization on nanotechnology

G Staikov, A Milchev - Electrocrystallization in Nanotechnology, 2007 - Wiley Online Library
Electrocrystallization processes occurring at electrochemical solid/liquid interfaces have for
a long time attracted the interest of many researchers from both fundamental and applied …

Growth of Pt by surface limited redox replacement of underpotentially deposited hydrogen

J Nutariya, M Fayette, N Dimitrov, N Vasiljevic - Electrochimica acta, 2013 - Elsevier
A surface limited redox replacement (SLRR) protocol for the growth of Pt thin films using
adsorbed H or also called underpotentially deposited H (H-UPD) is developed in this work …

Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers

D Gokcen, SE Bae, SR Brankovic - Electrochimica Acta, 2011 - Elsevier
The study of the kinetics of metal deposition via surface limited red-ox replacement of
underpotentially deposited metal monolayers is presented. The model system was Pt …

Metal film electrodes prepared with a reversibly deposited mediator in voltammetric analysis of metal ions

K Tyszczuk-Rotko - Current Opinion in Electrochemistry, 2019 - Elsevier
Electrochemical stripping analysis is recognized as a powerful technique for trace metals
owing its remarkable sensitivity, relatively inexpensive instrumentation, ability for …

Open circuit stability of underpotentially deposited Pb monolayer on Cu (1 1 1)

R Vasilic, N Vasiljevic, N Dimitrov - Journal of Electroanalytical Chemistry, 2005 - Elsevier
The stability of underpotentially deposited (UPD) Pb layer on Cu (111) is investigated by
conventional electrochemical techniques in perchlorate solution at open circuit potential …

Epitaxial growth by monolayer-restricted galvanic displacement

R Vasilic, N Dimitrov - Electrochemical and Solid-State Letters, 2005 - iopscience.iop.org
The development of a new method for epitaxial growth of metals in solution is discussed and
illustrated by proof-of-concept results. Cyclic voltammetry and scanning tunneling …