A comprehensive review on FinFET in terms of its device structure and performance matrices
The revolutions made in the CMOS technology are brought up by, continuous downscaling
in order to obtain higher density, better performance and low power consumption, causing …
in order to obtain higher density, better performance and low power consumption, causing …
Sustaining the future: Semiconductor materials and their recovery
A Kumar, A Thorbole, RK Gupta - Materials Science in Semiconductor …, 2025 - Elsevier
The recent advances in artificial intelligence point to a dramatic acceleration in the pace of
technological evolution. In their never-ending quest to push the boundaries of what is now …
technological evolution. In their never-ending quest to push the boundaries of what is now …
Scaling trends of digital single-event effects: A survey of SEU and SET parameters and comparison with transistor performance
D Kobayashi - IEEE Transactions on Nuclear Science, 2020 - ieeexplore.ieee.org
The history of integrated circuit (IC) development is another record of human challenges
involving space. Efforts have been made to protect ICs from sudden malfunctions due to …
involving space. Efforts have been made to protect ICs from sudden malfunctions due to …
Single-event upsets in a 7-nm bulk FinFET technology with analysis of threshold voltage dependence
In this work, single-event upset (SEU) responses of D flip-flop (FF) designs with different
threshold-voltage options in a 7-nm bulk FinFET technology are examined. Experimental …
threshold-voltage options in a 7-nm bulk FinFET technology are examined. Experimental …
Strategic review on different materials for FinFET structure performance optimization
KB Madhavi, SL Tripathi - IOP Conference Series: Materials …, 2020 - iopscience.iop.org
In this paper, the strategic review of different materials that are used in FinFET structure is
studied. This is achieved by using carefully designed source/drain spacers and doped …
studied. This is achieved by using carefully designed source/drain spacers and doped …
A fast simulation method for evaluating the single-event effect in aerospace integrated circuits
X Zhang, Y Liu, C Xu, X Liao, D Chen, Y Yang - Micromachines, 2023 - mdpi.com
With the continuous progress in integrated circuit technology, single-event effect (SEE) has
become a key factor affecting the reliability of aerospace integrated circuits. Simulating fault …
become a key factor affecting the reliability of aerospace integrated circuits. Simulating fault …
Impact of Design and Process on Alpha-Induced SER in 4 nm Bulk-FinFET SRAM
T Uemura, B Chung, S Chung, S Lee… - 2023 IEEE …, 2023 - ieeexplore.ieee.org
This paper evaluates alpha-induced soft error rate (αSER) by alpha irradiation test in four
different SRAMs and simulation. The test result shows the impact of three factors on αSER …
different SRAMs and simulation. The test result shows the impact of three factors on αSER …
Comprehensive Study of SER in FDSOI-Planar: 28 nm to 18 nm Scaling Effect and Temperature Dependence
T Uemura, B Chung, J Choi, S Lee… - 2024 IEEE …, 2024 - ieeexplore.ieee.org
We evaluate the soft error rate (SER) in 18 nm FDSOI-planar SRAM and investigate the
scaling trend of SER in FDSOI-planar. Our findings demonstrate that the SER in 18 nm …
scaling trend of SER in FDSOI-planar. Our findings demonstrate that the SER in 18 nm …
Soft-error susceptibility in flip-flop in EUV 7 nm bulk-FinFET technology
T Uemura, B Chung, J Jo, M Kim, D Lee… - 2021 IEEE …, 2021 - ieeexplore.ieee.org
This paper presents single-event upset (SEU) rates in flip-flops (FFs) in EUV 7 nm bulk-
FinFET technology. EUV technology achieves high transistor-density, small FF cell-size, and …
FinFET technology. EUV technology achieves high transistor-density, small FF cell-size, and …
Characterization of Surface α-Particle Radiation, Internal Traceability and Simulation of Typical Tin Spheres
L Liu, Z Zhang, H Zhang, H Li, Z Lei, J Luo, C Peng… - Applied Sciences, 2024 - mdpi.com
Surface α-particle emissivity testing and spectral characterization of two leaded tin spheres
(Sn10% Pb90%, Sn63% Pb37%) and one lead-free tin sphere (Sn96. 5% Ag3. 0% Cu0. 5 …
(Sn10% Pb90%, Sn63% Pb37%) and one lead-free tin sphere (Sn96. 5% Ag3. 0% Cu0. 5 …