Chemical–mechanical polishing of 4H silicon carbide wafers
Abstract 4H silicon carbide (4H‐SiC) holds great promise for high‐power and high‐
frequency electronics, in which high‐quality 4H‐SiC wafers with both global and local …
frequency electronics, in which high‐quality 4H‐SiC wafers with both global and local …
Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect
W Wang, B Zhang, Y Shi, J Zhou, R Wang… - Applied Surface Science, 2022 - Elsevier
Silicon carbide (SiC) is challenging to process by chemical mechanical polishing (CMP)
given its anomaly mechanical hardness and chemically inert. However, improving the SiC …
given its anomaly mechanical hardness and chemically inert. However, improving the SiC …
Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2
W Wang, B Zhang, Y Shi, T Ma, J Zhou, R Wang… - Journal of Materials …, 2021 - Elsevier
Chemical mechanical polishing (CMP) has revolutionized the processing of semiconductor
material such as silicon carbide (SiC). However, the strong chemical bond between silicon …
material such as silicon carbide (SiC). However, the strong chemical bond between silicon …
Effects of polishing media on the surface chemical and micromechanical properties of SiC
X Li, X Wu, P Wu, J Yuan, Y Zhu - Computational Materials Science, 2024 - Elsevier
Abstract Hydrogen peroxide (H 2 O 2) has been widely used to improve polishing
performance in chemical mechanical polishing (CMP) of silicon carbide (SiC), but the …
performance in chemical mechanical polishing (CMP) of silicon carbide (SiC), but the …
[HTML][HTML] Ultra-precision diamond finishing of reaction-sintered silicon carbide enhanced by vibration-assisted photocatalytic oxidation
Z Geng, Y Liang, F Fang - Journal of Materials Processing Technology, 2024 - Elsevier
RS-SiC faces limitations in surface accuracy with conventional finishing processes due to its
high mechanical hardness and multiphase nature. In this study, vibration-assisted …
high mechanical hardness and multiphase nature. In this study, vibration-assisted …
Meso-silica/Erbium-doped ceria binary particles as functionalized abrasives for photochemical mechanical polishing (PCMP)
A Chen, Y Duan, Z Mu, W Cai, Y Chen - Applied Surface Science, 2021 - Elsevier
We report the design and synthesis of meso-silica/ceria binary composite particles and their
usage as functionalized abrasives for photochemical mechanical polishing (PCMP). Meso …
usage as functionalized abrasives for photochemical mechanical polishing (PCMP). Meso …
Prediction of the surface roughness and material removal rate in chemical mechanical polishing of single-crystal SiC via a back-propagation neural network
Chemical mechanical polishing (CMP) is a common method for realising the global
planarisation and polishing of single-crystal SiC and other semiconductor substrates. The …
planarisation and polishing of single-crystal SiC and other semiconductor substrates. The …
The mechanism of Fenton reaction of hydrogen peroxide with single crystal 6H-SiC substrate
The strong oxidant hydroxyl radical (* OH) generated during Fenton reactions can be used
for the chemical mechanical polishing (CMP) of single-crystal silicon carbide (SiC). In this …
for the chemical mechanical polishing (CMP) of single-crystal silicon carbide (SiC). In this …
Tribological behavior of single crystal diamond based on UV photocatalytic reaction
W Liu, Q Xiong, J Lu, X Wang, Q Yan - Tribology International, 2022 - Elsevier
The tribological behaviors of single crystal diamond (SCD) under different UV photocatalytic
conditions (UV intensity, H 2 O 2 content, pH) were investigated by ball-on-disk rotating …
conditions (UV intensity, H 2 O 2 content, pH) were investigated by ball-on-disk rotating …
Influences of different carbon substrates on the morphologies of carbon/g-C3N4 photocatalytic composites and the purification capacities of different composites in the …
Z Shi, L Rao, P Wang, L Zhang - Chemosphere, 2022 - Elsevier
In order to explore the influence of various carbon introduction on the morphology and
photodegradation performance of C/gC 3 N 4 composites, three kinds of different carbon …
photodegradation performance of C/gC 3 N 4 composites, three kinds of different carbon …