III–V nanowires and nanowire optoelectronic devices

Y Zhang, J Wu, M Aagesen, H Liu - Journal of Physics D: Applied …, 2015 - iopscience.iop.org
III–V nanowires (NWs) have been envisioned as nanoscale materials for next-generation
technology with good functionality, superior performance, high integration ability and low …

Metalorganic vapor phase epitaxy of III–V-on-silicon: Experiment and theory

O Supplie, O Romanyuk, C Koppka, M Steidl… - Progress in Crystal …, 2018 - Elsevier
The integration of III–V semiconductors with Si has been pursued for more than 25 years
since it is strongly desired in various high-efficiency applications ranging from …

Rationally designed single-crystalline nanowire networks

D Car, J Wang, MA Verheijen, EPAM Bakkers… - Advanced …, 2014 - hal.science
Rational bottom-up assembly of nanowire networks may be a way to successfully continue
the miniaturization, which is the main driving force behind the semiconductor industry. So …

Nanowires grown on InP (100): growth directions, facets, crystal structures, and relative yield control

HA Fonseka, P Caroff, J Wong-Leung, AS Ameruddin… - ACS …, 2014 - ACS Publications
Growth of III–V nanowires on the [100]-oriented industry standard substrates is critical for
future integrated nanowire device development. Here we present an in-depth analysis of the …

[HTML][HTML] GaAs hetero-epitaxial layers grown by MOVPE on exactly-oriented and off-cut (1 1 1) Si: Lattice tilt, mosaicity and defects content

N Lovergine, I Miccoli, L Tapfer, P Prete - Applied Surface Science, 2023 - Elsevier
Integration of III-V devices with Si-photonics and fabrication of monolithic III-V/Si tandem
solar cells require the heteroepitaxy of III-V compounds on Si. We report on the lattice tilt …

Recent progress in integration of III–V nanowire transistors on Si substrate by selective-area growth

K Tomioka, T Fukui - Journal of Physics D: Applied Physics, 2014 - iopscience.iop.org
We report on the recent progress in electronic applications using III–V nanowires (NWs) on
Si substrates using the selective-area growth method. This method could align vertical III–V …

Ultracompact position-controlled InP nanopillar LEDs on silicon with bright electroluminescence at telecommunication wavelengths

S Deshpande, I Bhattacharya, G Malheiros-Silveira… - Acs …, 2017 - ACS Publications
Highly compact III–V compound semiconductor active nanophotonic devices integrated with
silicon are important for future low power optical interconnects. One approach toward …

Indium antimonide nanowires: synthesis and properties

M Shafa, S Akbar, L Gao, M Fakhar-e-Alam… - Nanoscale research …, 2016 - Springer
This article summarizes some of the critical features of pure indium antimonide nanowires
(InSb NWs) growth and their potential applications in the industry. In the first section …

Revealing Inclined Twin Related Defects in III–V Nanowires Grown in Popular Alternative Crystallographic Directions

HA Fonseka, N Denis, JA Gott, X Yuan… - The Journal of …, 2024 - ACS Publications
Even after two decades of research, conventional⟨ 111⟩ B oriented III–V nanowires are
often perturbed by twins and stacking faults that form perpendicular to their growth direction …

High-temperature nucleation of GaP on v-grooved si

TE Saenz, WE McMahon, AG Norman… - Crystal Growth & …, 2020 - ACS Publications
The use of nanopatterned {111}-faceted v-grooves has recently shown promise for growing
high-quality III–V material on Si. Here, we study the effect of reactor conditions and surface …