Atomistic simulation of physical vapor deposition of optical thin films

FV Grigoriev, VB Sulimov - Nanomaterials, 2023 - mdpi.com
A review of the methods and results of atomistic modeling of the deposition of thin optical
films and a calculation of their characteristics is presented. The simulation of various …

Three-dimensional kinetic Monte Carlo simulations of cubic transition metal nitride thin film growth

F Nita, C Mastail, G Abadias - Physical Review B, 2016 - APS
A three-dimensional kinetic Monte Carlo (KMC) model has been developed and used to
simulate the microstructure and growth morphology of cubic transition metal nitride (TMN) …

Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO2

JS Agustsson, UB Arnalds, AS Ingason… - Applied Surface …, 2008 - Elsevier
Ultra thin platinum films were grown by dc magnetron sputtering on thermally oxidized Si
(100) substrates. The electrical resistance of the films was monitored in situ during growth …

[PDF][PDF] 薄膜外延生长的计算机模拟

郑小平, 张佩峰, 刘军, 贺德衍, 马健泰 - 2004 - wulixb.iphy.ac.cn
以Cu 膜为例, 用Monte/Carlo 算法模拟了薄膜生长的随机过程, 并提出了更加完善的模型.
在合理选择原子间相互作用计算方法的基础上, 考虑了原子的吸附, 在生长表面的迁移及迁移所 …

A hybrid kinetic Monte Carlo method for simulating silicon films grown by plasma-enhanced chemical vapor deposition

DG Tsalikis, C Baig, VG Mavrantzas… - The Journal of …, 2013 - pubs.aip.org
We present a powerful kinetic Monte Carlo (KMC) algorithm that allows one to simulate the
growth of nanocrystalline silicon by plasma enhanced chemical vapor deposition (PECVD) …

Atomistic Monte Carlo simulations of three-dimensional polycrystalline thin films

JE Rubio, M Jaraiz, I Martin-Bragado… - Journal of Applied …, 2003 - pubs.aip.org
The deposition of polycrystalline thin films is essential to the fabrication of microelectronic
devices. About half of the processing steps are devoted to deposition of metal conductors …

Kinetic Monte Carlo simulation of the electrodeposition of polycrystalline copper: Effects of substrates and deposition parameters on the microstructure of deposits

J Liu, C Liu, PP Conway - Electrochimica Acta, 2013 - Elsevier
A two-dimensional cross-sectional poly-lattice kinetic Monte Carlo (2DCSP-KMC) model has
been developed for simulation of the electrodeposition of polycrystalline copper on either a …

A computer simulation of nucleation and growth of thin films

P Zhang, X Zheng, S Wu, D He - Computational materials science, 2004 - Elsevier
A three-dimensional kinetic Monte Carlo technique has been developed for simulating the
nucleation and growth of thin films. The model involves incident atom attachment, surface …

薄膜生长过程的Monte Carlo 模拟

张佩峰, 郑小平, 贺德衍 - 2003 - ir.lzu.edu.cn
摘要用Monte Carlo 方法以Cu 为例对薄膜生长过程进行了计算机模拟. 不仅对原子的吸附,
迁移及脱附三种过程采用了更为合理的模型, 还考虑了这些过程发生时对近邻原子的连带效应 …

薄膜外延生长及其岛核形成的计算机模拟

郑小平, 张佩峰, 贺德衍, 刘军, 马健泰 - 2004 - ir.lzu.edu.cn
摘要以Cu 膜为例, 用Monte Carlo 算法模拟了薄膜生长的随机过程. 找到了生长过程中的三个
优化温度, 并研究了它们的渐近一致性, 同时对各种温度区间内表面粗糙度, 相对密度随入射率的 …