Amorphous InGaZnO and metal oxide semiconductor devices: an overview and current status

J Troughton, D Atkinson - Journal of Materials Chemistry C, 2019 - pubs.rsc.org
The past 20 years has witnessed a rapid expansion of applications using metal oxide
semiconductor devices that ranges from displays technology, to clothing and packaging …

Recent progress in high performance and reliable n-type transition metal oxide-based thin film transistors

JY Kwon, JK Jeong - Semiconductor Science and Technology, 2015 - iopscience.iop.org
This review gives an overview of the recent progress in vacuum-based n-type transition
metal oxide (TMO) thin film transistors (TFTs). Several excellent review papers regarding …

High-Performance Oxide-Based p–n Heterojunctions Integrating p-SnOx and n-InGaZnO

DH Lee, H Park, M Clevenger, H Kim… - … Applied Materials & …, 2021 - ACS Publications
The fabrication of oxide-based p–n heterojunctions that exhibit high rectification
performance has been difficult to realize using standard manufacturing techniques that …

Amorphous IGZO TFT with High Mobility of ∼70 cm2/(V s) via Vertical Dimension Control Using PEALD

J Sheng, TH Hong, HM Lee, KR Kim… - … applied materials & …, 2019 - ACS Publications
Amorphous InGaZnO x (a-IGZO) thin-film transistors (TFTs) are currently used in flat-panel
displays due to their beneficial properties. However, the mobility of∼ 10 cm2/(V s) for the a …

Flexible indium–gallium–zinc–oxide Schottky diode operating beyond 2.45 GHz

J Zhang, Y Li, B Zhang, H Wang, Q Xin… - Nature communications, 2015 - nature.com
Mechanically flexible mobile phones have been long anticipated due to the rapid
development of thin-film electronics in the last couple of decades. However, to date, no such …

High Electron mobility thin‐film transistors based on solution‐processed semiconducting metal oxide heterojunctions and quasi‐superlattices

YH Lin, H Faber, JG Labram, E Stratakis… - Advanced …, 2015 - Wiley Online Library
High mobility thin‐film transistor technologies that can be implemented using simple and
inexpensive fabrication methods are in great demand because of their applicability in a wide …

High-performance thin-film transistors with an atomic-layer-deposited indium gallium oxide channel: A cation combinatorial approach

HJ Yang, HJ Seul, MJ Kim, Y Kim, HC Cho… - … applied materials & …, 2020 - ACS Publications
The effect of gallium (Ga) concentration on the structural evolution of atomic-layer-deposited
indium gallium oxide (IGO)(In1–x Ga x O) films as high-mobility n-channel semiconducting …

[HTML][HTML] Tailoring the synaptic properties of a-IGZO memristors for artificial deep neural networks

ME Pereira, J Deuermeier, P Freitas, P Barquinha… - APL Materials, 2022 - pubs.aip.org
Neuromorphic computation based on resistive switching devices represents a relevant
hardware alternative for artificial deep neural networks. For the highest accuracies on …

High-Performance Indium Gallium Tin Oxide Transistors with an Al2O3 Gate Insulator Deposited by Atomic Layer Deposition at a Low Temperature of 150 °C: Roles of Hydrogen and …

CH Choi, T Kim, S Ueda, YS Shiah… - … Applied Materials & …, 2021 - ACS Publications
In this work, high-performance amorphous In0. 75Ga0. 23Sn0. 02O (a-IGTO) transistors with
an atomic layer-deposited Al2O3 dielectric layer were fabricated at a maximum processing …

Low thermal budget (< 250° C) dual-gate amorphous indium tungsten oxide (IWO) thin-film transistor for monolithic 3-D integration

W Chakraborty, H Ye, B Grisafe… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
We experimentally demonstrate back-end-of-the-line (BEOL) compatible (<; 250° C thermal
budget) 1% tungsten (W)-doped amorphous In 2 O 3 (IWO) back-gate field-effect transistor …