Amorphous InGaZnO and metal oxide semiconductor devices: an overview and current status
J Troughton, D Atkinson - Journal of Materials Chemistry C, 2019 - pubs.rsc.org
The past 20 years has witnessed a rapid expansion of applications using metal oxide
semiconductor devices that ranges from displays technology, to clothing and packaging …
semiconductor devices that ranges from displays technology, to clothing and packaging …
Recent progress in high performance and reliable n-type transition metal oxide-based thin film transistors
This review gives an overview of the recent progress in vacuum-based n-type transition
metal oxide (TMO) thin film transistors (TFTs). Several excellent review papers regarding …
metal oxide (TMO) thin film transistors (TFTs). Several excellent review papers regarding …
High-Performance Oxide-Based p–n Heterojunctions Integrating p-SnOx and n-InGaZnO
DH Lee, H Park, M Clevenger, H Kim… - … Applied Materials & …, 2021 - ACS Publications
The fabrication of oxide-based p–n heterojunctions that exhibit high rectification
performance has been difficult to realize using standard manufacturing techniques that …
performance has been difficult to realize using standard manufacturing techniques that …
Amorphous IGZO TFT with High Mobility of ∼70 cm2/(V s) via Vertical Dimension Control Using PEALD
J Sheng, TH Hong, HM Lee, KR Kim… - … applied materials & …, 2019 - ACS Publications
Amorphous InGaZnO x (a-IGZO) thin-film transistors (TFTs) are currently used in flat-panel
displays due to their beneficial properties. However, the mobility of∼ 10 cm2/(V s) for the a …
displays due to their beneficial properties. However, the mobility of∼ 10 cm2/(V s) for the a …
Flexible indium–gallium–zinc–oxide Schottky diode operating beyond 2.45 GHz
J Zhang, Y Li, B Zhang, H Wang, Q Xin… - Nature communications, 2015 - nature.com
Mechanically flexible mobile phones have been long anticipated due to the rapid
development of thin-film electronics in the last couple of decades. However, to date, no such …
development of thin-film electronics in the last couple of decades. However, to date, no such …
High Electron mobility thin‐film transistors based on solution‐processed semiconducting metal oxide heterojunctions and quasi‐superlattices
High mobility thin‐film transistor technologies that can be implemented using simple and
inexpensive fabrication methods are in great demand because of their applicability in a wide …
inexpensive fabrication methods are in great demand because of their applicability in a wide …
High-performance thin-film transistors with an atomic-layer-deposited indium gallium oxide channel: A cation combinatorial approach
HJ Yang, HJ Seul, MJ Kim, Y Kim, HC Cho… - … applied materials & …, 2020 - ACS Publications
The effect of gallium (Ga) concentration on the structural evolution of atomic-layer-deposited
indium gallium oxide (IGO)(In1–x Ga x O) films as high-mobility n-channel semiconducting …
indium gallium oxide (IGO)(In1–x Ga x O) films as high-mobility n-channel semiconducting …
[HTML][HTML] Tailoring the synaptic properties of a-IGZO memristors for artificial deep neural networks
Neuromorphic computation based on resistive switching devices represents a relevant
hardware alternative for artificial deep neural networks. For the highest accuracies on …
hardware alternative for artificial deep neural networks. For the highest accuracies on …
High-Performance Indium Gallium Tin Oxide Transistors with an Al2O3 Gate Insulator Deposited by Atomic Layer Deposition at a Low Temperature of 150 °C: Roles of Hydrogen and …
In this work, high-performance amorphous In0. 75Ga0. 23Sn0. 02O (a-IGTO) transistors with
an atomic layer-deposited Al2O3 dielectric layer were fabricated at a maximum processing …
an atomic layer-deposited Al2O3 dielectric layer were fabricated at a maximum processing …
Low thermal budget (< 250° C) dual-gate amorphous indium tungsten oxide (IWO) thin-film transistor for monolithic 3-D integration
We experimentally demonstrate back-end-of-the-line (BEOL) compatible (<; 250° C thermal
budget) 1% tungsten (W)-doped amorphous In 2 O 3 (IWO) back-gate field-effect transistor …
budget) 1% tungsten (W)-doped amorphous In 2 O 3 (IWO) back-gate field-effect transistor …