[HTML][HTML] Nanoscale tribological aspects of chemical mechanical polishing: A review

D Datta, H Rai, S Singh, M Srivastava… - Applied Surface Science …, 2022 - Elsevier
The semiconductor industry is the backbone of exponentially growing digitization. Countries
from the east and the west both are investing significantly to accelerate this growth …

Recent advances on porous siliceous materials derived from waste

D Montini, C Cara, M D'Arienzo, B Di Credico… - Materials, 2023 - mdpi.com
In recent years, significant efforts have been made in view of a transition from a linear to a
circular economy, where the value of products, materials, resources, and waste is …

Effects of trivalent lanthanide (La and Nd) doped ceria abrasives on chemical mechanical polishing

E Kim, J Lee, C Bae, H Seok, HU Kim, T Kim - Powder Technology, 2022 - Elsevier
During chemical mechanical polishing (CMP) for a dielectric layer, Ce 3+, which is the active
site on the surface of ceria, has a significant effect on the material removal rate (MRR). Ceria …

Plasma technology in antimicrobial surface engineering

A Nikiforov, C Ma, A Choukourov… - Journal of Applied …, 2022 - pubs.aip.org
The design of advanced materials with superb anti-bacterial efficiency by engineering
appropriate surface properties has now become a consolidated strategy to improve the …

Optimization of lapping processes of silicon wafer for photovoltaic applications

S Ozturk, L Aydin, N Kucukdogan, E Celik - Solar Energy, 2018 - Elsevier
The thinning of the silicon wafers and the smoothening of the surface are carried out by
grinding and lapping processes. The lapping process is especially preferred to produce less …

Chemical mechanical planarization of nanotwinned copper/polyimide for low temperature hybrid bonding

PS He, CW Tu, KC Shie, CY Liu, HY Tsai… - Journal of …, 2024 - Elsevier
In this study, fully cured low-temperature polyimide (PI) films and< 1 1 1>,< 1 1 0>,< 2 0 0>,
and< 2 1 1>-oriented Cu films on Si wafers were chosen to investigate the grinding effect on …

The way to zeros: The future of semiconductor device and chemical mechanical polishing technologies

M Tsujimura - Japanese Journal of Applied Physics, 2016 - iopscience.iop.org
For the last 60 years, the development of cutting-edge semiconductor devices has strongly
emphasized scaling; the effort to scale down current CMOS devices may well achieve the …

Enhanced surface flatness of vitrinite particles by broad ion beam polishing and implications for reflectance measurements

A Grobe, J Schmatz, R Littke, J Klaver… - International Journal of …, 2017 - Elsevier
Standardized measurements of vitrinite reflectance vary significantly between different
measuring institutions. The only systematically adjustable influence factor on these …

In vitro effect of acidic solutions and sodium fluoride on surface roughness of two types of CAD‐CAM dental ceramics

E Farhadi, H Kermanshah, S Rafizadeh… - … Journal of Dentistry, 2021 - Wiley Online Library
Objectives. This study assessed the effect of immersion in acidic solutions and sodium
fluoride on surface roughness of dental ceramics. Materials and Methods. 40 blocks of …

Vertically aligned boron-doped diamond nanostructures as highly efficient electrodes for electrochemical supercapacitors

S Suman, DK Sharma, O Szabo, B Rakesh… - Journal of Materials …, 2024 - pubs.rsc.org
Nanostructured boron-doped diamond (BDD) offers a sizeable ion-accessible area, high
mechanical robustness, and high electrical conductivity, and could be a suitable electrode …