[HTML][HTML] Nanoscale tribological aspects of chemical mechanical polishing: A review
The semiconductor industry is the backbone of exponentially growing digitization. Countries
from the east and the west both are investing significantly to accelerate this growth …
from the east and the west both are investing significantly to accelerate this growth …
Recent advances on porous siliceous materials derived from waste
In recent years, significant efforts have been made in view of a transition from a linear to a
circular economy, where the value of products, materials, resources, and waste is …
circular economy, where the value of products, materials, resources, and waste is …
Effects of trivalent lanthanide (La and Nd) doped ceria abrasives on chemical mechanical polishing
During chemical mechanical polishing (CMP) for a dielectric layer, Ce 3+, which is the active
site on the surface of ceria, has a significant effect on the material removal rate (MRR). Ceria …
site on the surface of ceria, has a significant effect on the material removal rate (MRR). Ceria …
Plasma technology in antimicrobial surface engineering
A Nikiforov, C Ma, A Choukourov… - Journal of Applied …, 2022 - pubs.aip.org
The design of advanced materials with superb anti-bacterial efficiency by engineering
appropriate surface properties has now become a consolidated strategy to improve the …
appropriate surface properties has now become a consolidated strategy to improve the …
Optimization of lapping processes of silicon wafer for photovoltaic applications
The thinning of the silicon wafers and the smoothening of the surface are carried out by
grinding and lapping processes. The lapping process is especially preferred to produce less …
grinding and lapping processes. The lapping process is especially preferred to produce less …
Chemical mechanical planarization of nanotwinned copper/polyimide for low temperature hybrid bonding
PS He, CW Tu, KC Shie, CY Liu, HY Tsai… - Journal of …, 2024 - Elsevier
In this study, fully cured low-temperature polyimide (PI) films and< 1 1 1>,< 1 1 0>,< 2 0 0>,
and< 2 1 1>-oriented Cu films on Si wafers were chosen to investigate the grinding effect on …
and< 2 1 1>-oriented Cu films on Si wafers were chosen to investigate the grinding effect on …
The way to zeros: The future of semiconductor device and chemical mechanical polishing technologies
M Tsujimura - Japanese Journal of Applied Physics, 2016 - iopscience.iop.org
For the last 60 years, the development of cutting-edge semiconductor devices has strongly
emphasized scaling; the effort to scale down current CMOS devices may well achieve the …
emphasized scaling; the effort to scale down current CMOS devices may well achieve the …
Enhanced surface flatness of vitrinite particles by broad ion beam polishing and implications for reflectance measurements
Standardized measurements of vitrinite reflectance vary significantly between different
measuring institutions. The only systematically adjustable influence factor on these …
measuring institutions. The only systematically adjustable influence factor on these …
In vitro effect of acidic solutions and sodium fluoride on surface roughness of two types of CAD‐CAM dental ceramics
E Farhadi, H Kermanshah, S Rafizadeh… - … Journal of Dentistry, 2021 - Wiley Online Library
Objectives. This study assessed the effect of immersion in acidic solutions and sodium
fluoride on surface roughness of dental ceramics. Materials and Methods. 40 blocks of …
fluoride on surface roughness of dental ceramics. Materials and Methods. 40 blocks of …
Vertically aligned boron-doped diamond nanostructures as highly efficient electrodes for electrochemical supercapacitors
Nanostructured boron-doped diamond (BDD) offers a sizeable ion-accessible area, high
mechanical robustness, and high electrical conductivity, and could be a suitable electrode …
mechanical robustness, and high electrical conductivity, and could be a suitable electrode …