Weakly ionized plasmas at or near 1 atm pressure, or atmospheric-pressure plasmas, have
received increasing attention due to their scientific significance and potential for use in a …

Optical spectroscopy is a powerful, nonintrusive diagnostic tool that can provide
unparalleled insight into fundamental plasma properties. Specifically, these techniques are …

Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …

Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …

The aim of this study is to investigate the effect of radio frequency (RF) plasma power on the
morphology, crystal structure, elemental chemical composition, and optical properties of ZnO …

Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …

The aim of this work was to examine the influence of radio frequency (rf) power on ZnO films
synthesized by means of chemical vapor transport technique in inductively coupled plasma …

The microwave cutoff probe (CP) is an accurate diagnostic technique to measure absolute
electron density even in processing gas plasmas. Because this technique needs the …

Self-organized striated structures of the plasma emission have recently been observed in
capacitive radio-frequency CF 4 plasmas by phase resolved optical emission spectroscopy …

Nanocrystalline (NC) FeSi 2 films were created on Si (111) wafers via direct-current
sputtering with facing targets at an ambient temperature, then the films were etched by Ar …