Solid phase crystallization (SPC) of amorphous silicon films grown by low pressure chemical
vapor deposition was conducted using a tube furnace in nitrogen ambient at temperatures …

There is a large gap between the vast solar resources and the magnitude of solar energy
deployment in Argentina. In the case of photovoltaics, the country only reached the 1000 …

Abstract Plasma Enhanced Chemical Vapor Deposition (PECVD) has been used for direct
production of wafer-equivalent quality silicon thin film solar cells, includes the nc-Si: H …

Hydrogenated nanocrystalline silicon (nc-Si: H) thin films prepared in a home-built radio-
frequency (rf) plasma enhanced chemical vapour deposition (PECVD) system have been …

The origin of waveguiding in the bulk of silicon after sub‐ps laser inscription is investigated.
Locally resolved Raman measurements of waveguide cross sections and along the …

This study deals with the fabrication and characterization of silicon nanoparticles in a SiN x
dielectric matrix to have thin films of different gap energies, films essentially based on …

By an analysis of the local crystallinity based on model potential molecular dynamics
simulations we investigated the effect of dissolved hydrogen on the thermally induced …

This work investigates the nickel-induced crystallization (NIC) method for crystallizing
hydrogenated amorphous silicon (a-Si: H) thin films on glass substrates. The a-Si: H …

We report high-quality hydrogenated nanocrystalline silicon (nc-Si: H) thin films were
prepared by facing targets sputtering (FTS) in the environment of Ar and H 2 mixture gases …

Hydrogenated nanocrystalline silicon (nc-Si: H) thin films deposited on c-Si and quartz
substrates by layer-by-layer (LBL) technique using radio-frequency plasma enhanced …