Recent progress of integrated circuits and optoelectronic chips

Y Hao, S Xiang, G Han, J Zhang, X Ma, Z Zhu… - Science China …, 2021 - Springer
Integrated circuits (ICs) and optoelectronic chips are the foundation stones of the modern
information society. The IC industry has been driven by the so-called “Moore's law” in the …

The evolution of manufacturing technology for GaN electronic devices

AC Liu, PT Tu, C Langpoklakpam, YW Huang… - Micromachines, 2021 - mdpi.com
GaN has been widely used to develop devices for high-power and high-frequency
applications owing to its higher breakdown voltage and high electron saturation velocity …

Power delivery for high-performance microprocessors—challenges, solutions, and future trends

K Radhakrishnan, M Swaminathan… - IEEE Transactions …, 2021 - ieeexplore.ieee.org
The power delivery requirements for the early microprocessors were fairly rudimentary due
to the relatively low power levels. However, several decades of exponential scaling powered …

Self-Aligned E-Mode GaN p-Channel FinFET With ION > 100 mA/mm and ION/IOFF > 10⁷

N Chowdhury, Q Xie, T Palacios - IEEE Electron Device Letters, 2022 - ieeexplore.ieee.org
This letter demonstrates self-aligned-channel FinFETs based on a GaN-on-Si wafer. While
the self-aligned gate process helps to achieve shortest possible source-to-drain distance to …

[HTML][HTML] A review of GaN RF devices and power amplifiers for 5G communication applications

H Lu, M Zhang, L Yang, B Hou, RP Martinez, M Mi… - Fundamental …, 2023 - Elsevier
In the emerging 5G and beyond 5G (B5G) era, the spotlight is sharply focused on the power
amplifier, a critical component with stringent specification requirements that dictates the …

Enhancement-mode 300-mm GaN-on-Si (111) with integrated Si CMOS for future mm-wave RF applications

HW Then, M Radosavljevic, Q Yu… - IEEE Microwave and …, 2023 - ieeexplore.ieee.org
A 300-mm GaN-on-Si (111) high-gate dielectric E-mode GaN MOSHEMT technology is
demonstrated with uniform process and wafer characteristics. The E-mode GaN MOSHEMT …

Quasi-physical equivalent circuit model of RF leakage current in substrate including temperature dependence for GaN-HEMT on Si

Y Yamaguchi, T Oishi - IEEE Transactions on Microwave …, 2023 - ieeexplore.ieee.org
This article proposes a quasi-physical equivalent circuit model of RF leakage current in the
substrate including temperature dependence for GaN-high-electron-mobility transistor …

Gallium nitride power amplifiers for Ka-band Satcom applications: Requirements, trends, and the way forward

R Giofrè, A Piacibello, P Colantonio… - IEEE Microwave …, 2023 - ieeexplore.ieee.org
The current trend in satellite communications is moving toward high carrier frequencies and
complex modulated signals, which have a nonconstant envelope, such as quadrature …

AlGaN/GaN Distributed Schottky Barrier Single-Pole Single-Throw Millimeter-Wave Switches

P Bajurko, J Sobolewski, Y Yashchyshyn, P Sai… - IEEE …, 2023 - ieeexplore.ieee.org
This paper presents two designs of millimeter-wave single-pole single-throw switches based
on AlGaN/GaN heterostructure. The switches are based on two approaches to the travelling …

Wafer-Scale GaN-Si (100) Monolithic Heterogeneous Integration Inverters With Improved Output Voltage Swing and Fast Switching Capability by Transfer Printing and …

Y Fan, W Zhang, Z Liu, S Zhao, Y Jiang… - … on Electron Devices, 2024 - ieeexplore.ieee.org
In this article, wafer-scale gallium nitride (GaN)-Si (100) monolithic integration material was
achieved by transfer printing and self-aligned etching technology. A monolithic …