Metal oxide semiconductor-based Schottky diodes: a review of recent advances

NA Al-Ahmadi - Materials Research Express, 2020 - iopscience.iop.org
Abstract Metal-oxide-semiconductor (MOS) structures are essential for a wide range of
semiconductor devices. This study reviews the development of MOS Schottky diode, which …

Chemical States, Structural, Electrical and Current Phenomenon Properties of a Au/Cobalt Phthalocyanine/Undoped-InP MPS-Type Diode with a CoPc Interlayer

A Usha Rani, V Rajagopal Reddy… - Journal of Inorganic and …, 2024 - Springer
This work reviews the impact of cobalt phthalocyanine (CoPc) interlayers on the electrical
and current transport properties of Au/undoped-InP Schottky diodes (SDs). The crystalline …

Examination on the current conduction mechanisms of Au/n-Si diodes with ZnO–PVP and ZnO/Ag2WO4 –PVP interfacial layers

İ Taşçıoğlu, G Pirgholi-Givi, SA Yerişkin… - Journal of Sol-Gel …, 2023 - Springer
This study reports a comparative characterization of Au/n-Si Schottky diodes/contacts (SDs)
with hydrothermally synthesized ZnO–PVP and ZnO/Ag2WO4–PVP interfacial layers, which …

Jet Nebulizer Sprayed WO3-Nanoplate Arrays for High-Photoresponsivity Based Metal–Insulator–Semiconductor Structured Schottky Barrier Diodes

R Marnadu, J Chandrasekaran… - Journal of Inorganic and …, 2020 - Springer
Monoclinic WO 3-nanoplate arrays have been effectively deposited via simple jet nebulizer
spray pyrolysis technique at an optimized substrate temperature of 400° C. These WO 3 …

Investigation of electrical characterization of Al/HfO2/p-Si structures in wide temperature range

S Bengi, E Yükseltürk, MM Bülbül - Journal of Materials Science: Materials …, 2023 - Springer
We studied the I–V characteristics of Al/HfO2/p-Si structure investigated in a wide
temperature range of 80–400 K. The zero-bias barrier height (Φ B) and ideality factor (n) …

Effect of annealing on chemical, structural and electrical properties of Au/Gd2O3/n-GaN heterostructure with a high-k rare-earth oxide interlayer

CV Prasad, MSP Reddy, VR Reddy, C Park - Applied Surface Science, 2018 - Elsevier
The chemical, structural and electrical characteristics of a fabricated Au/Gd 2 O 3/n-GaN
heterostructure with gadolinium oxide (Gd 2 O 3) as an insulating layer are explored by XPS …

Zirconia modified nanostructured MoO3 thin films deposited by spray pyrolysis technique for Cu/MoO3-ZrO2/p-Si structured Schottky barrier diode application

P Vivek, J Chandrasekaran, R Marnadu… - Optik, 2019 - Elsevier
We report an inorganic aqueous solution route for pure molybdenum trioxide (MoO 3) and
zirconium oxide composite (MoO 3-ZrO 2) insulating layer of Cu/MoO 3-ZrO 2/p-Si metal …

Impact of Zr content on multiphase zirconium–tungsten oxide (Zr–WOx) films and its MIS structure of Cu/Zr–WOx/p-Si Schottky barrier diodes

R Marnadu, J Chandrasekaran, M Raja… - Journal of Materials …, 2018 - Springer
Abstract Metal–insulator–semiconductor (MIS) structure of Cu/Zr–WO x/p-Si Schottky diodes
with different concentrations (0, 4 and 8 wt%) of Zr content were fabricated. The interfacial …

Fabrication of Cu/Y-MoO3/p-Si type Schottky barrier diodes by facile spray pyrolysis technique for photodetection application

P Vivek, J Chandrasekaran… - Sensors and Actuators A …, 2022 - Elsevier
The metal-semiconductor interface is a regular multitudinous photoelectric device like
Schottky barrier diodes (SBDs) applications. Here we have designed a metal-insulator …

Influence of metal work function and incorporation of Sr atom on WO3 thin films for MIS and MIM structured SBDs

R Marnadu, J Chandrasekaran, M Raja, M Balaji… - Superlattices and …, 2018 - Elsevier
In this work, two different structure of Cu/Sr-WO 3/p-Si metal-insulator-semiconductor (MIS)
and Cu/Sr-WO 3/FTO metal-insulator-metal (MIM) Schottky barrier diodes (SBDs) fabricated …