Hydrogel microparticles from lithographic processes: Novel materials for fundamental and applied colloid science

ME Helgeson, SC Chapin, PS Doyle - Current opinion in colloid & interface …, 2011 - Elsevier
In recent years, there has been a surge in methods to synthesize geometrically and
chemically complex microparticles. Analogous to atoms, the concept of a “periodic table” of …

[HTML][HTML] Fabrication of high-resolution fine microneedles derived from hydrolyzed hyaluronic acid gels in vacuum environment imprinting using water permeable mold

S Miura, R Yamagishi, R Miyazaki, K Yasuda… - Gels, 2022 - mdpi.com
Hydrolyzed hyaluronic acid high-resolution fine microneedles of 13 µm in diameter and 24
µm in height were fabricated from hydrolyzed hyaluronic acid gels made in mixtures of water …

Thermal nanoimprint lithography of sodium hyaluronate solutions with gas permeable inorganic hybrid mold for cosmetic and pharmaceutical applications

R Yamagishi, S Miura, K Yasuda, N Sugino… - Applied Physics …, 2022 - iopscience.iop.org
Gas-permeable inorganic hybrid mold that hybridized the surface layer of TiO 2–SiO 2 gas-
permeable polymer using the sol–gel method and the lower layer of porous maraging steel …

Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction

S Takei, M Hanabata - Applied Physics Letters, 2015 - pubs.aip.org
An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous
template was investigated for the reduction of air trapping and template damage caused by …

Eco-friendly electron beam lithography using water-developable resist material derived from biomass

S Takei, A Oshima, T Wakabayashi, T Kozawa… - Applied Physics …, 2012 - pubs.aip.org
We investigated the eco-friendly electron beam (EB) lithography using a high-sensitive
negative type of water-developable resist material derived from biomass on hardmask layer …

Reduction of pattern peeling in step-and-flash imprint lithography

S Takei, T Ogawa, R Deschner, CG Willson - Microelectronic engineering, 2014 - Elsevier
A strong adhesion force between resist and underlayer materials was employed to reduce
resist pattern peeling generated from de-molding in step-and-flash imprint lithography …

Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

S Takei, A Oshima, T Ichikawa, A Sekiguchi… - Microelectronic …, 2014 - Elsevier
We have demonstrated an organic solvent-free water-developable branched sugar resist
material derived from biomass for its use in green electron beam lithography. This …

Photoinitiated ring‐opening metathesis polymerization

W Joo, CH Chen, JP Moerdyk… - Journal of Polymer …, 2019 - Wiley Online Library
INTRODUCTION Ring-opening metathesis polymerization (ROMP) is a valuable technique
for converting strained cyclic olefins to their respective polyalkenamers. 1 Although myriad …

[HTML][HTML] Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography

S Takei, H Maki, K Sugahara, K Ito, M Hanabata - AIP Advances, 2015 - pubs.aip.org
An electron beam (EB) lithography method using inedible cellulose-based resist material
derived from woody biomass has been successfully developed. This method allows the use …

Development of nanoimprint lithography template materials using biomass

S Nakajima, S Takei, Z Zhou, H Maki… - Journal of …, 2016 - jstage.jst.go.jp
A template using biomass materials in nanoimprint lithography has gas permeability that is
expected to reduce defects from air trapping and template damage. The dependences of …