Light source, EUV lithography system, and method for generating EUV radiation
C Yang, SY Chen, SC Chien, C Hsieh, TC Fu… - US Patent …, 2020 - Google Patents
A light source for extreme ultraviolet (EUV) radiation is provided. The light source includes a
target droplet generator, a laser generator, a measuring device, and a controller. The target …
target droplet generator, a laser generator, a measuring device, and a controller. The target …
Residual gain monitoring and reduction for EUV drive laser
CL Chang, JH Yeh, HL Chang, TC Fu, BT Liu… - US Patent …, 2021 - Google Patents
(57) ABSTRACT A system includes a laser source operable to provide a laser beam, a laser
amplifier having a gain medium operable to provide energy to the laser beam when the …
amplifier having a gain medium operable to provide energy to the laser beam when the …
Method and apparatus for removing debris from collector
WU Shang-Ying, MH Tsai, SK Yu… - US Patent …, 2020 - Google Patents
Debris is removed from a collector of an extreme ultraviolet light source vessel by applying a
suction force through a vacuum opening of a cable. The method for removing debris also …
suction force through a vacuum opening of a cable. The method for removing debris also …
Radiation source apparatus and method for using the same
TU Wei-Chung, SK Yu, SC Chien, LJ Chen… - US Patent …, 2024 - Google Patents
A radiation source apparatus includes a vessel, a laser source, a collector, a horizontal
obscuration bar, and a reflective mirror. The vessel has an exit aperture. The laser source is …
obscuration bar, and a reflective mirror. The vessel has an exit aperture. The laser source is …
Radiation source apparatus and method for using the same
TU Wei-Chung, SK Yu, SC Chien, LJ Chen… - US Patent …, 2023 - Google Patents
A radiation source apparatus includes a vessel, a laser source, a collector, and a reflective
mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and …
mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and …
Light source, EUV lithography system, and method for performing circuit layout patterning process
C Yang, SY Chen, SC Chien, C Hsieh, TC Fu… - US Patent …, 2023 - Google Patents
A light source for EUV radiation is provided. The light source includes a target droplet
generator, a laser generator, and a controller. The target droplet generator is configured to …
generator, a laser generator, and a controller. The target droplet generator is configured to …
Residual gain monitoring and reduction for EUV drive laser
CL Chang, JH Yeh, HL Chang, TC Fu, BT Liu… - US Patent …, 2023 - Google Patents
A system includes a laser source operable to provide a laser beam, a laser amplifier having
a gain medium operable to provide energy to the laser beam when the laser beam passes …
a gain medium operable to provide energy to the laser beam when the laser beam passes …
Light source, EUV lithography system, and method for generating EUV radiation
C Yang, SY Chen, SC Chien, C Hsieh, TC Fu… - US Patent …, 2022 - Google Patents
A light source for EUV is provided. The light source includes a target droplet generator, a
laser generator, and a controller. The target droplet generator is configured to provide target …
laser generator, and a controller. The target droplet generator is configured to provide target …