Approaches to synthesize MgO nanostructures for diverse applications
Magnesium oxide remained interesting from long time for several important phenomena like;
defect induced magnetism, spin electron reflectivity, broad laser emission etc. Moreover …
defect induced magnetism, spin electron reflectivity, broad laser emission etc. Moreover …
Low-temperature plasma-enhanced atomic layer deposition of ZnMgO for efficient CZTS solar cells
Cu2ZnSnS4 (CZTS) solar cells are an emerging photovoltaic technology owing to their earth
abundance, all-dry processability, and environmental friendliness. Further power conversion …
abundance, all-dry processability, and environmental friendliness. Further power conversion …
Atomic layer deposition from dissolved precursors
We establish a novel thin film deposition technique by transferring the principles of atomic
layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a …
layer deposition (ALD) known with gaseous precursors toward precursors dissolved in a …
Reliable high temperature, high humidity flexible thin film encapsulation using Al2O3/MgO nanolaminates for flexible OLEDs
Since most organic materials are very sensitive to moisture and oxygen, organic light
emitting diodes (OLEDs) require an encapsulation layer to protect the active layer from these …
emitting diodes (OLEDs) require an encapsulation layer to protect the active layer from these …
[HTML][HTML] Collagen membrane functionalized with magnesium oxide via room-temperature atomic layer deposition promotes osteopromotive and antimicrobial …
Artificial bone grafting materials such as collagen are gaining interest due to the ease of
production and implantation. However, collagen must be supplemented with additional …
production and implantation. However, collagen must be supplemented with additional …
Bottom-up and top-down approaches for MgO
In this chapter, we present an overview of synthesis of MgO nanoparticles and thin films by
using top-down and bottom-up approaches. The bottom-up approaches are generally …
using top-down and bottom-up approaches. The bottom-up approaches are generally …
High‐Quality Plasmonic Materials TiN and ZnO: Al by Atomic Layer Deposition
N Izyumskaya, D Fomra, K Ding… - physica status solidi …, 2021 - Wiley Online Library
Electromagnetic radiation when coupled to collective oscillations of free electrons, dubbed
as plasmonics, makes it possible to manipulate light at dimensions well below the diffraction …
as plasmonics, makes it possible to manipulate light at dimensions well below the diffraction …
Atomic-scale tuning of ultrathin memristors
R Goul, A Marshall, S Seacat, H Peelaers… - Communications …, 2022 - nature.com
Continuous device downsizing and circuit complexity have motivated atomic-scale tuning of
memristors. Herein, we report atomically tunable Pd/M1/M2/Al ultrathin (< 2.5 nm M1/M2 …
memristors. Herein, we report atomically tunable Pd/M1/M2/Al ultrathin (< 2.5 nm M1/M2 …
Mg-doped β-Ga2O3 films with tunable optical band gap prepared on MgO (110) substrates by metal-organic chemical vapor deposition
X Feng, Z Li, W Mi, Y Luo, J Ma - Materials Science in Semiconductor …, 2015 - Elsevier
Abstract The Mg-doped β-Ga 2 O 3 (β-Ga 2 O 3: Mg) films have been prepared on the MgO
(110) substrates by the metal-organic chemical vapor deposition (MOCVD) technique. The …
(110) substrates by the metal-organic chemical vapor deposition (MOCVD) technique. The …
Secondary electron emission characteristics of the Al2O3/MgO double-layer structure prepared by atomic layer deposition
W Cao, B Wang, Y Yang, B Zhu, J Guo, P Xu, X Bai… - Ceramics …, 2021 - Elsevier
As a secondary electron emission layer, an Al 2 O 3/MgO double-layer structure is fabricated
by atomic layer deposition (ALD) technology. The thickness range from 1 nm to 4 nm of the …
by atomic layer deposition (ALD) technology. The thickness range from 1 nm to 4 nm of the …