N-polar GaN: Epitaxy, properties, and device applications

S Mohanty, K Khan, E Ahmadi - Progress in Quantum Electronics, 2023 - Elsevier
Abstract In recent years, Gallium Nitride (GaN) has been established as a material of choice
for high power switching, high power RF and lighting applications. In c-direction, depending …

Perspective: Toward efficient GaN-based red light emitting diodes using europium doping

B Mitchell, V Dierolf, T Gregorkiewicz… - Journal of Applied …, 2018 - pubs.aip.org
While InGaN/GaN blue and green light-emitting diodes (LEDs) are commercially available,
the search for an efficient red LED based on GaN is ongoing. The realization of this LED is …

A review of the synthesis of reduced defect density InxGa1− xN for all indium compositions

EA Clinton, E Vadiee, CAM Fabien, MW Moseley… - Solid-State …, 2017 - Elsevier
A review of metal rich and nitrogen rich (N-rich), low-temperature grown In x Ga 1− x N is
provided, focusing on two low-temperature approaches that have resulted in non-phase …

Guidelines and limitations for the design of high-efficiency InGaN single-junction solar cells

CAM Fabien, WA Doolittle - Solar Energy Materials and Solar Cells, 2014 - Elsevier
Indium gallium nitride (InGaN) alloys offer great potential for high-efficiency photovoltaics,
yet theoretical promise has not been experimentally demonstrated. Several major …

Graphene‐Nanorod Enhanced Quasi‐Van Der Waals Epitaxy for High Indium Composition Nitride Films

S Zhang, B Liu, F Ren, Y Yin, Y Wang, Z Chen, B Jiang… - Small, 2021 - Wiley Online Library
The nitride films with high indium (In) composition play a crucial role in the fabrication of In‐
rich InGaN‐based optoelectronic devices. However, a major limitation is In incorporation …

Evaluation of high-performance, self-powered and wavelength-selective InGaN/GaN multiple quantum well UV photodetectors fabricated on sapphire substrate …

P Dalapati, K Yamamoto, T Egawa… - Sensors and Actuators A …, 2021 - Elsevier
The impact of growth temperature (GT), in the range from 875° to 825° C, on the
morphological, structural, electrical, and optical properties of InGaN/GaN multiple quantum …

Surface evolution of thick InGaN epilayers with growth interruption time

Z Lv, H Wang, H Jiang - The Journal of Physical Chemistry C, 2021 - ACS Publications
Surface morphology of thick In x Ga1–x N (x∼ 0.14) epilayers mediated by growth
interruption was investigated. The interruption was performed by changing the turn-off time …

High In-content InGaN layers synthesized by plasma-assisted molecular-beam epitaxy: Growth conditions, strain relaxation, and In incorporation kinetics

S Valdueza-Felip, E Bellet-Amalric… - Journal of Applied …, 2014 - pubs.aip.org
We report the interplay between In incorporation and strain relaxation kinetics in high-In-
content In x Ga 1-x N (x= 0.3) layers grown by plasma-assisted molecular-beam epitaxy. For …

Low-temperature growth of InGaN films over the entire composition range by MBE

CAM Fabien, BP Gunning, WA Doolittle… - Journal of Crystal …, 2015 - Elsevier
The surface morphology, microstructural, and optical properties of indium gallium nitride
(InGaN) films grown by plasma-assisted molecular beam epitaxy under low growth …

[HTML][HTML] Negative differential resistance in GaN homojunction tunnel diodes and low voltage loss tunnel contacts

EA Clinton, E Vadiee, SC Shen, K Mehta… - Applied Physics …, 2018 - pubs.aip.org
The current-voltage characteristics and metastability in GaN p++/n++ homojunction tunnel
diodes and n++/p++/i/n tunnel-contacted diodes grown via metal modulated epitaxy have …