[图书][B] The nanotechnology revolution: a global bibliographic perspective
DA Stirling - 2018 - taylorfrancis.com
Nanotechnology is changing the world in a very big way, but at the atomic and sub-atomic
level. Although the roots of nanotechnology can be traced back to more than a century ago …
level. Although the roots of nanotechnology can be traced back to more than a century ago …
Toxicity of abrasive nanoparticles (SiO2, CeO2, and Al2O3) on Aliivibrio fischeri and human bronchial epithelial cells (16HBE14o-)
Abstract SiO 2, CeO 2, and Al 2 O 3 nanoparticles (NPs) are used as abrasive particles in
chemical and mechanical planarization (CMP), a key process in semiconductor fabrication …
chemical and mechanical planarization (CMP), a key process in semiconductor fabrication …
Assessment of Change in Physicochemical Properties and Cellular Toxicity of Pre-and Post-CMP Silica Slurries
K Kosaraju, S Crawford, M Tarannum… - ECS Journal of Solid …, 2015 - iopscience.iop.org
With the large-scale use of silica nanoparticles (SNPs) in Chemical Mechanical
Planarization (CMP) processes, it is very important to study their potential effect on human …
Planarization (CMP) processes, it is very important to study their potential effect on human …
Cellular Toxicity Assessment and Environmental Impact of Pre-and Post-CMP Nanoparticle Slurries
K Kosaraju, S Crawford, S Aravamudhan - ECS Transactions, 2015 - iopscience.iop.org
Nanoparticles (NPs) of silica, ceria and alumina are used as polishing slurries for Chemical
Mechanical Planarization (CMP). However, the regulations for use and toxic levels of ENPs …
Mechanical Planarization (CMP). However, the regulations for use and toxic levels of ENPs …
[图书][B] Study of toxicity and uptake of nanoparticles towards understanding biotic-abiotic interactions
K Kosaraju - 2015 - search.proquest.com
With the rapid growth in nanotechnology and tremendous applications the engineered
nanomaterials (ENs) offer, there is increase in usage of ENs which increases their likelihood …
nanomaterials (ENs) offer, there is increase in usage of ENs which increases their likelihood …
[PDF][PDF] Cytotoxicity of Engineered Nanoparticles Used in Industrial Processing
S Crawford - 2019 - libres.uncg.edu
Chemical Mechanical Planarization (CMP) is a polishing technique used in the
semiconductor industry to thin and flatten stacked layers of metal and dielectric materials in …
semiconductor industry to thin and flatten stacked layers of metal and dielectric materials in …