Fabrication and performance of GaN electronic devices

SJ Pearton, F Ren, AP Zhang, KP Lee - Materials Science and Engineering …, 2000 - Elsevier
GaN and related materials (especially AlGaN) have recently attracted a lot of interest for
applications in high power electronics capable of operation at elevated temperatures …

GaN electronics

SJ Pearton, F Ren - Advanced Materials, 2000 - Wiley Online Library
An overview is presented of progress in GaN electronic devices for high‐power, high‐
temperature applications. The wide bandgaps of the nitride materials, their excellent …

The 2018 GaN power electronics roadmap

H Amano, Y Baines, E Beam, M Borga… - Journal of Physics D …, 2018 - iopscience.iop.org
Gallium nitride (GaN) is a compound semiconductor that has tremendous potential to
facilitate economic growth in a semiconductor industry that is silicon-based and currently …

Optical and structural properties of epitaxial alloys

AK Sharma, J Narayan, JF Muth, CW Teng… - Applied Physics …, 1999 - pubs.aip.org
The optical and structural properties of high-quality single-crystal epitaxial MgZnO films
deposited by pulsed-laser deposition were studied. In films with up to∼ 36 at.% Mg …

Electrical effects of plasma damage in

XA Cao, SJ Pearton, AP Zhang, GT Dang, F Ren… - Applied physics …, 1999 - pubs.aip.org
The reverse breakdown voltage of p-GaN Schottky diodes was used to measure the
electrical effects of high density Ar or H 2 plasma exposure. The near surface of the p-GaN …

Heterogeneous integration of compound semiconductors

O Moutanabbir, U Gösele - Annual Review of Materials …, 2010 - annualreviews.org
The ability to tailor compound semiconductors and to integrate them onto foreign substrates
can lead to superior or novel functionalities with a potential impact on various areas in …

Mg doping of GaN layers grown by plasma-assisted molecular-beam epitaxy

IP Smorchkova, E Haus, B Heying, P Kozodoy… - Applied Physics …, 2000 - pubs.aip.org
GaN: Mg layers grown by plasma-assisted molecular-beam epitaxy at 650° C are
investigated. Secondary-ion-mass-spectroscopy measurements reveal uniform Mg doping …

Inductively coupled plasma-induced etch damage of GaN junctions

RJ Shul, L Zhang, AG Baca, CG Willison… - Journal of Vacuum …, 2000 - pubs.aip.org
Plasma-induced etch damage can degrade the electrical and optical performance of III–V
nitride electronic and photonic devices. We have investigated the etch-induced damage of …

Interface properties of thermally oxidized n-GaN metal–oxide–semiconductor capacitors

Y Nakano, T Jimbo - Applied physics letters, 2003 - pubs.aip.org
We report on the interface properties of thermally oxidized n-GaN metal–oxide–
semiconductor capacitors fabricated on sapphire substrates. 100-nm-thick β-Ga 2 O 3 was …

Diffusion of Mg dopant in metal-organic vapor-phase epitaxy grown GaN and AlxGa1− xN

K Köhler, R Gutt, J Wiegert, L Kirste - Journal of Applied Physics, 2013 - pubs.aip.org
Diffusion of the p-type dopant Mg in GaN and Al x Ga 1− x N which is accompanied by
segregation and affected by transient effects in metal-organic vapor-phase epitaxy reactors …