The effect of deposition conditions on the properties of Zr-carbide, Zr-nitride and Zr-carbonitride coatings–a review

A Ul-Hamid - Materials Advances, 2020 - pubs.rsc.org
Zirconium-based coatings exhibit a range of useful properties such as high hardness, high
temperature stability, biocompatibility, and good resistance to wear, erosion, corrosion and …

Preferred orientation and hardness enhancement of TiN/CrN superlattice coatings deposited by reactive magnetron sputtering

Q Yang, C He, LR Zhao, JP Immarigeon - Scripta materialia, 2002 - Elsevier
TiN/CrN superlattice coatings with various bilayer periods are deposited by reactive
magnetron sputtering. The preferred orientations of the superlattices can be controlled …

Structure and mechanical properties of polycrystalline CrN/TiN superlattices

P Yashar, SA Barnett, J Rechner… - Journal of Vacuum …, 1998 - pubs.aip.org
Polycrystalline CrN/TiN superlattice films were deposited on M1 tool steel using unbalanced
reactive magnetron sputtering with opposed cathodes. The Cr and Ti targets were sputtered …

Effects of phase stability, lattice ordering, and electron density on plastic deformation in cubic TiWN pseudobinary transition-metal nitride alloys

DG Sangiovanni, L Hultman, V Chirita, I Petrov… - Acta Materialia, 2016 - Elsevier
We carry out density functional theory calculations to compare the energetics of layer glide,
as well as stress vs. strain curves, for cubic Ti 0.5 W 0.5 N pseudobinary alloys and …

Deposition of TiN thin films on Si (100) by HCD ion plating

WJ Chou, GP Yu, JH Huang - Surface and Coatings Technology, 2001 - Elsevier
Titanium nitride (TiN) films were deposited on Si (100) substrates using a hollow cathode
discharge ion plating (HCD-IP) technique. Based on previous experimental results, the …

The effect of deposition temperature on microstructure and properties of thermal CVD TiN coatings

J Wagner, C Mitterer, M Penoy, C Michotte… - International Journal of …, 2008 - Elsevier
Coatings of TiN have been deposited by thermal CVD between 850 and 1050° C and
characterized with respect to their microstructure as well as mechanical and tribological …

Bias effect of ion-plated zirconium nitride film on Si (100)

WJ Chou, GP Yu, JH Huang - Thin Solid Films, 2002 - Elsevier
Zirconium nitride (ZrN) films were deposited on Si (100) substrates using the hollow cathode
ion-plated (HCD-IP) technique. The deposition conditions were designed to deposit …

Characterization of misfit dislocations in epitaxial (001)-oriented TiN, NbN, VN, and (Ti, Nb) N film heterostructures by transmission electron microscopy

L Hultman, M Shinn, PB Mirkarimi, SA Barnett - Journal of crystal growth, 1994 - Elsevier
Transmission electron microscopy (TEM) was employed to characterize the misfit dislocation
systems in epitaxial bilayer films of TiN, NbN, VN, and TiNbN as a function of overlayer film …

Effect of nitrogen flow rate on the structure and mechanical properties of ZrN thin films on Si (1 0 0) and stainless steel substrates

JH Huang, CH Ho, GP Yu - Materials chemistry and physics, 2007 - Elsevier
Nanocrystalline ZrN films were successfully deposited on Si (100) and AISI 304 stainless
steel substrates using hollow cathode discharge ion-plating (HCD-IP). The effect of nitrogen …

Structural, mechanical, electrical and wetting properties of ZrNx films deposited by Ar/N2 vacuum arc discharge: Effect of nitrogen partial pressure

B Abdallah, M Naddaf, M A-kharroub - Nuclear Instruments and Methods in …, 2013 - Elsevier
Non-stiochiometric zirconium nitride (ZrNx) thin films have been deposited on silicon
substrates by vacuum arc discharge of (N2+ Ar) gas mixtures at different N2 partial pressure …