[HTML][HTML] Diffusion of n-type dopants in germanium

A Chroneos, H Bracht - Applied Physics Reviews, 2014 - pubs.aip.org
Germanium is being actively considered by the semiconductor community as a mainstream
material for nanoelectronic applications. Germanium has advantageous materials …

Oxygen defect processes in silicon and silicon germanium

A Chroneos, EN Sgourou, CA Londos… - Applied Physics …, 2015 - pubs.aip.org
Silicon and silicon germanium are the archetypical elemental and alloy semiconductor
materials for nanoelectronic, sensor, and photovoltaic applications. The investigation of …

Diffusion of E centers in germanium predicted using GGA+ U approach

H Tahini, A Chroneos, RW Grimes… - Applied Physics …, 2011 - pubs.aip.org
Density functional theory calculations (based on GGA+U approach) are used to investigate
the formation and diffusion of donor-vacancy pairs (E centers) in germanium. We conclude …

Impact of isovalent doping on the trapping of vacancy and interstitial related defects in Si

EN Sgourou, D Timerkaeva, CA Londos… - Journal of Applied …, 2013 - pubs.aip.org
We investigate the impact of isovalent (in particular lead (Pb)) doping on the production and
thermal stability of the vacancy-related (VO) and the interstitial-related (C i O i and C i C s) …

Fluorine effect on As diffusion in Ge

G Impellizzeri, S Boninelli, F Priolo… - Journal of Applied …, 2011 - pubs.aip.org
The enhanced diffusion of donor atoms, via a vacancy (V)-mechanism, severely affects the
realization of ultrahigh doped regions in miniaturized germanium (Ge) based devices. In this …

First-principles study of radiation defects in silicon

V Pelenitsyn, P Korotaev - Computational Materials Science, 2022 - Elsevier
The study of the properties of defects in silicon forming under irradiation condition has been
carried out for many years, however, many open questions remain. Particularly, there are not …

Impurity engineering of Czochralski silicon

X Yu, J Chen, X Ma, D Yang - Materials Science and Engineering: R …, 2013 - Elsevier
Microelectronic devices with high integration level and functional complexity are always
requiring larger diameter and more perfect Czochralski (CZ) silicon wafers. Therefore, the …

Effect of tin doping on oxygen-and carbon-related defects in Czochralski silicon

A Chroneos, CA Londos, EN Sgourou - Journal of Applied Physics, 2011 - pubs.aip.org
Experimental and theoretical techniques are used to investigate the impact of tin doping on
the formation and the thermal stability of oxygen-and carbon-related defects in electron …

Seventy-five years since the point-contact transistor: Germanium revisited

EN Sgourou, A Daskalopulu, LH Tsoukalas… - Applied Sciences, 2022 - mdpi.com
The advent of the point-contact transistor is one of the most significant technological
achievements in human history with a profound impact on human civilization during the past …

Diffusion and dopant activation in germanium: Insights from recent experimental and theoretical results

EN Sgourou, Y Panayiotatos, RV Vovk, N Kuganathan… - Applied Sciences, 2019 - mdpi.com
Germanium is an important mainstream material for many nanoelectronic and sensor
applications. The understanding of diffusion at an atomic level is important for fundamental …