A review of band structure and material properties of transparent conducting and semiconducting oxides: Ga2O3, Al2O3, In2O3, ZnO, SnO2, CdO, NiO, CuO, and …
This Review highlights basic and transition metal conducting and semiconducting oxides.
We discuss their material and electronic properties with an emphasis on the crystal …
We discuss their material and electronic properties with an emphasis on the crystal …
[HTML][HTML] Status and prospects of plasma-assisted atomic layer deposition
Processing at the atomic scale is becoming increasingly critical for state-of-the-art electronic
devices for computing and data storage, but also for emerging technologies such as related …
devices for computing and data storage, but also for emerging technologies such as related …
Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook
HM Kim, DG Kim, YS Kim, M Kim… - International Journal of …, 2023 - iopscience.iop.org
Since the first report of amorphous In–Ga–Zn–O based thin film transistors, interest in oxide
semiconductors has grown. They offer high mobility, low off-current, low process …
semiconductors has grown. They offer high mobility, low off-current, low process …
extremely thin amorphous indium oxide transistors
Amorphous oxide semiconductor transistors have been a mature technology in display
panels for upward of a decade, and have recently been considered as promising back‐end …
panels for upward of a decade, and have recently been considered as promising back‐end …
[HTML][HTML] Atomic layer deposition of conductive and semiconductive oxides
B Macco, WMM Kessels - Applied Physics Reviews, 2022 - pubs.aip.org
Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, doping …
conductivity and optical transparency can be modulated through material design (eg, doping …
High mobility polycrystalline indium oxide thin-film transistors by means of plasma-enhanced atomic layer deposition
Indium oxide thin films are deposited via plasma-enhanced atomic layer deposition (PEALD)
to exploit their potential as a semiconductor in high mobility thin-film transistors (TFTs) …
to exploit their potential as a semiconductor in high mobility thin-film transistors (TFTs) …
Recent development of advanced electrode materials by atomic layer deposition for electrochemical energy storage
Electrode materials play a decisive role in almost all electrochemical energy storage
devices, determining their overall performance. Proper selection, design and fabrication of …
devices, determining their overall performance. Proper selection, design and fabrication of …
Structural, Optical, and Electrical Properties of InOx Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Flexible Device Applications
TH Hong, KR Kim, SH Choi, SH Lee… - ACS Applied …, 2022 - ACS Publications
Indium oxide (InO x) thin films have attractive carrier transport properties for oxide
semiconductors because of the large isotropic 5 s orbital overlap. In this study, InO x films …
semiconductors because of the large isotropic 5 s orbital overlap. In this study, InO x films …
Indium oxide thin films by atomic layer deposition using trimethylindium and ozone
AU Mane, AJ Allen, RK Kanjolia… - The Journal of Physical …, 2016 - ACS Publications
We investigated the atomic layer deposition (ALD) of indium oxide (In2O3) thin films using
alternating exposures of trimethylindium (TMIn) and a variety of oxygen sources: ozone (O3) …
alternating exposures of trimethylindium (TMIn) and a variety of oxygen sources: ozone (O3) …
Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido) …
HY Kim, EA Jung, G Mun, RE Agbenyeke… - … Applied Materials & …, 2016 - ACS Publications
Low-temperature growth of In2O3 films was demonstrated at 70–250° C by plasma-
enhanced atomic layer deposition (PEALD) using a newly synthesized liquid indium …
enhanced atomic layer deposition (PEALD) using a newly synthesized liquid indium …