In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

The plasma over a magnetron's erosion “racetrack” is not azimuthally uniform but
concentrated in distinct dense ionization zones which move in the E× B direction with about …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

Pulsed plasmas use much higher power during each pulse compared to continuously
operated plasmas. This feature and the appearance of additional new variables such as …

Emission spectra in the visible and near ultraviolet have been recorded for the magnetron
sputtering of titanium by argon at pressures between 0.5 and 100 Pa. Intense emission lines …