Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review

I Hwang, M Choe, D Jeon, IH Baek - Journal of Materials Chemistry C, 2024 - pubs.rsc.org
The accelerated evolution of artificial intelligence (AI) and semiconductor technologies has
fostered a mutually reinforcing relationship, whereby each technology has contributed to the …

Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors

HY Lee, JS Hur, I Cho, CH Choi, SH Yoon… - … Applied Materials & …, 2023 - ACS Publications
Indium oxide (In2O3) is a transparent wide-bandgap semiconductor suitable for use in the
back-end-of-line-compatible channel layers of heterogeneous monolithic three-dimensional …

Specific contact resistivity reduction in amorphous IGZO thin-film transistors through a TiN/IGTO heterogeneous interlayer

JH Jeong, SW Seo, D Kim, SH Yoon, SH Lee… - Scientific Reports, 2024 - nature.com
Oxide semiconductors have gained significant attention in electronic device industry due to
their high potential for emerging thin-film transistor (TFT) applications. However, electrical …

All‐Solution‐Processed InGaO/PbI2 Heterojunction for Self‐Powered Omnidirectional Near‐Ultraviolet Photodetection and Imaging

J Zhang, Z Sa, P Li, Z Zhai, F Liu… - Advanced Optical …, 2024 - Wiley Online Library
The persistent photocurrent (PPC) and high carrier concentration are challenging the
ultraviolet photodetection behaviors of amorphous InGaO films. Herein, InGaO/PbI2 …

The comprehensive study of hybrid dielectric layer adopted organic thin film transistors for low voltage operation

SL Priya, TW Haung, K Agrahari, YW Wang - Journal of Molecular Liquids, 2024 - Elsevier
Organic electronics hold immense promise due to their flexibility, low-cost processing, and
diverse applications. Despite tremendous progress, low-voltage operation has remained a …

Strong Immunity to Drain-Induced Barrier Lowering in ALD-Grown Preferentially Oriented Indium Gallium Oxide Transistors

GB Kim, T Kim, SW Bang, JS Hur, CH Choi… - … Applied Materials & …, 2024 - ACS Publications
Drain-induced barrier lowering (DIBL) is one of the most critical obstacles degrading the
reliability of integrated circuits based on miniaturized transistors. Here, the effect of a …

Achieving High Field-effect Mobility Exceeding 90 cm2/Vs in a-IGZTO Transistors with Excellent Reliability

BJ Park, SW Chung, MJ Kim, HJ Lee… - IEEE Electron …, 2023 - ieeexplore.ieee.org
In this letter, amorphous indium-gallium-zinc-tin oxide (-IGZTO) thin-film transistors (TFTs)
were characterized with a bottom gate structure, where a single target with three cation …

Double-gate structure enabling remote Coulomb scattering-free transport in atomic-layer-deposited IGO thin-film transistors with HfO2 gate dielectric through insertion …

CH Choi, T Kim, MJ Kim, GB Kim, JE Oh, JK Jeong - Scientific Reports, 2024 - nature.com
In this paper, high-performance indium gallium oxide (IGO) thin-film transistor (TFT) with a
double-gate (DG) structure was developed using an atomic layer deposition route. The …

c-Axis Aligned 3 nm Thick In2O3 Crystal Using New Liquid DBADMIn Precursor for Highly Scaled FET Beyond the Mobility–Stability Trade-off

SH Choi, SH Ryu, DG Kim, JH Kwag, C Yeon… - Nano Letters, 2024 - ACS Publications
Oxide semiconductors (OS) are attractive materials for memory and logic device applications
owing to their low off-current, high field effect mobility, and superior large-area uniformity …

Comparative Study of Indium Oxide Films for High‐Mobility TFTs: ALD, PLD and Solution Process

M Guo, J Wu, H Ou, D Xie, Q Zhu… - Advanced Electronic …, 2024 - Wiley Online Library
Deposition of indium oxide base films for high‐mobility thin film transistors (TFTs) has been
an important part in the implementation of high‐resolution and high‐frequency display back …