Tunable electrical properties of Ti-BN thin films sputter-deposited by the reactive gas pulsing process
Titanium-boron-nitrogen (Ti-BN) thin films were deposited by RF reactive magnetron
sputtering using a titanium diboride (TiB2) target in an argon+ nitrogen mixture. The argon …
sputtering using a titanium diboride (TiB2) target in an argon+ nitrogen mixture. The argon …
Electronic properties of surface modified LiO thinfilms with H+ implantation
A Sudha, NMI Alhaji, AM Saleem, SB Mohamed… - Materials Today …, 2023 - Elsevier
A thermal evaporation technique was used to examine how hydrogen ion implantation
affected the structural, electrical, and optical properties of a LiO thin film created on an ITO …
affected the structural, electrical, and optical properties of a LiO thin film created on an ITO …