Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …

Plasma-enhanced atomic layer deposition (PEALD) has obtained a prominent position in
the synthesis of nanoscale films with precise growth control. Apart from the well-established …

Atomic layer etching (ALE), a cyclic process of surface modification and removal of the
modified layer, is an emerging damage-less etching technology for semiconductor …

Anisotropic plasma-enhanced atomic layer etching (ALE) requires directional ions with a
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …

The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …

In particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations of capacitively coupled
plasmas (CCPs), the plasma-surface interaction is generally described by a simple model in …

The ion-induced secondary electron emission coefficient (γ) is a vital parameter in the
modeling of low temperature RF plasmas. Often, the value of γ drastically affects the electron …

It is generally recognized that the electron temperature T e either remains constant or
decreases slightly with plasma power (plasma density). This trend can be simply verified …

The effect of a capacitive radio frequency (RF) substrate bias on the E-to H-mode transition
and electron-heating dynamics in a low-pressure inductively coupled plasma (ICP) operated …

Experimental verification of the discharge mode transition and the hysteresis by considering
matching circuit is investigated in inductively coupled plasma using measurements of the …