Photovoltaic technology: the case for thin-film solar cells

A Shah, P Torres, R Tscharner, N Wyrsch, H Keppner - science, 1999 - science.org
The advantages and limitations of photovoltaic solar modules for energy generation are
reviewed with their operation principles and physical efficiency limits. Although the main …

Light management in thin film silicon solar cells

FJ Haug, C Ballif - Energy & Environmental Science, 2015 - pubs.rsc.org
Thin film silicon is an attractive and versatile material for photovoltaics whose manufacturing
reached a high level of maturity. Owing to its moderate efficiency compared to crystalline …

Plasma CVD process using a very-high-frequency and plasma CVD apparatus

N Okamura, A Yamagami, S Takaki - US Patent 5,534,070, 1996 - Google Patents
57 ABSTRACT A plasma CVD process comprises conducting film forma tion in a reaction
chamber capable of being substantially vacuumed in which a plurality of cylindrical …

Thermal performance of Si and GaAs based solar cells and modules: a review

E Radziemska - Progress in Energy and Combustion Science, 2003 - Elsevier
This review summarizes the recent progress obtained in the field of the temperature
performance of crystalline and amorphous silicon solar cells and modules. It gives a general …

Frequency effects in silane plasmas for plasma enhanced chemical vapor deposition

AA Howling, JL Dorier, C Hollenstein, U Kroll… - Journal of Vacuum …, 1992 - pubs.aip.org
It is now generally recognized that the excitation frequency is an important parameter in
radio‐frequency (rf) plasma‐assisted deposition. Very‐high‐frequency (VHF) silane …

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

H Schmidt, L Sansonnens, AA Howling… - Journal of applied …, 2004 - pubs.aip.org
Experiments using a lens-shaped circular electrode are described to measure the correction
of plasma nonuniformity due to the standing wave effect in a large area very high frequency …

A self-consistent fluid model for radio-frequency discharges in compared to experiments

GJ Nienhuis, WJ Goedheer, EAG Hamers… - Journal of applied …, 1997 - pubs.aip.org
A one-dimensional fluid model for radio-frequency glow discharges is presented which
describes silane/hydrogen discharges that are used for the deposition of amorphous silicon …

Plasma process apparatus and plasma process method

S Takaki, A Yamagami - US Patent 6,065,425, 2000 - Google Patents
In order to effect a plasma process at a high rate, such as formation of a high-quality deposit
film having very uniform thickness and quality over a large-area substrate,(1) an oscillation …

[图书][B] Plasma deposition of amorphous silicon-based materials

P Capezzuto, A Madan - 1995 - books.google.com
Semiconductors made from amorphous silicon have recently become important for their
commercial applications in optical and electronic devices including FAX machines, solar …

Properties of interfaces in amorphous/crystalline silicon heterojunctions

S Olibet, E Vallat‐Sauvain, L Fesquet… - … status solidi (a), 2010 - Wiley Online Library
To study recombination at the amorphous/crystalline Si (a‐Si: H/c‐Si) heterointerface, the
amphoteric nature of silicon (Si) dangling bonds is taken into account. Modeling interface …