The purpose of this book is the development of the principles and experimental techniques
underlying near edge X-ray absorption fine structure (NEXAFS) spectroscopy and the …

This Report reviews the use of molecular-beam reactive scattering to study the surface
reactions of gas molecules on semiconductors which have relevance to microelectronic …

We describe a unified model for silicon oxidation in dry and wet conditions. It goes beyond
the current models of kinetics and of ellipsometric and spectroscopic data by explicitly …

Molecular oxygen (O 2) is a paramagnetic linear molecule, yet the effect of its molecular
alignment and electron spin on the dynamics of O 2 adsorption has remained unclear …

The change in the chemical surface state of polished Si wafers [p-type,(100) oriented] during
storage in air at room temperature was investigated for storage times up to half a year …

Near-edge x-ray-absorption fine-structure spectroscopy studies are used to determine
changes in the electronic, geometric, and magnetic structure of two sequential molecular …

Abstract Aluminum nanoclusters (Al n NCs), particularly Al13−(n= 13), exhibit superatomic
behavior with interplay between electron shell closure and geometrical packing in an …

We present a detailed study of the adsorption kinetics of O2 on Si (100) between
temperatures of 120 and 800 K and oxygen coverages up to 2 monolayers, and of the …

ABSTRACT X-ray photoelectron spectroscopy and secondary ion mass spectrometry are
used to study the surface chemistry of silicon single-crystal wafers. Anhydrous HF and …

In the initial stage of oxygen adsorption on Si (111) surfaces, a metastable molecular state is
found which precedes dissociation and insertion of oxygen atoms in bridging positions …