The concept of the transformation of molecules to materials has been well established in the
field of chemical vapor deposition (CVD) and atomic layer deposition (ALD). However …

This review provides a comprehensive overview of the most recent progress in chemistry
and applications of metal complexes containing heteroallylic ligands such as amidinates …

The thermal chemistry of copper (I)-N, N′-di-sec-butylacetamidinate on Ni (110) single-
crystal and cobalt polycrystalline surfaces was characterized under ultrahigh vacuum (UHV) …

The oriented growth of β‐Ga2O3 films has triggered extensive interest due to the remarkable
and complex anisotropy found in the β‐Ga2O3 bulks. Remarkable properties, including …

For decades, ligands such as phosphanes or cyclopentadienyl ring derivatives have
dominated Coordination and Organometallic Chemistry. At the same time, alternative …

A bottom-up approach starting with the development of new Hf precursors for plasma-
enhanced atomic layer deposition (PEALD) processes for HfO2 followed by in situ thin-film …

Volatile metal complexes are important for chemical vapour deposition (CVD) and atomic
layer deposition (ALD) to deliver metal components to growing thin films. Compounds that …

Abstract Monoclinic hafnia (m-HfO 2) films were prepared on polycrystalline AlN substrates
via thermal and laser chemical vapor deposition (thermal CVD and laser CVD). Highly self …

Metal amidinates are common compounds with many applications, and are of particular
value as precursors for the chemical deposition of thin metal films on solid surfaces. In order …

The thermal chemistry of several metal organic compounds with amidinate, diketonate, or
cyclopentadienyl (Cp) ligands on oxide surfaces, mainly on silicon dioxide but also on …