Block copolymer nanopatterning for nonsemiconductor device applications

GG Yang, HJ Choi, KH Han, JH Kim… - … Applied Materials & …, 2022 - ACS Publications
Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication
tool for semiconductor devices and other applications, because of its ability to organize well …

Recent progress in non-photolithographic patterning of polymer thin films

M Qiu, W Du, S Zhou, P Cai, Y Luo, X Wang… - Progress in Polymer …, 2023 - Elsevier
Patterned polymer thin films are essential components in many devices and applications
owing to the multi-functionality, flexibility, lightweight and cost-efficiency. Unfortunately …

Polyhedral oligomeric silsesquioxane hybrid polymers: well‐defined architectural design and potential functional applications

F Chen, F Lin, Q Zhang, R Cai, Y Wu… - Macromolecular Rapid …, 2019 - Wiley Online Library
Polyhedral oligomeric silsesquioxane (POSS)‐hybrid polymers have been successfully
employed as functional inorganic–organic hybrid materials for various applications due to …

Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach

PP Angelopoulou, I Moutsios, GM Manesi… - Progress in Polymer …, 2022 - Elsevier
This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …

Recent advances in RAFT polymerization: Novel initiation mechanisms and optoelectronic applications

X Tian, J Ding, B Zhang, F Qiu, X Zhuang, Y Chen - Polymers, 2018 - mdpi.com
Reversible addition-fragmentation chain transfer (RAFT) is considered to be one of most
famous reversible deactivation radical polymerization protocols. Benefiting from its living or …

From macromonomers to bottlebrush copolymers with sequence control: synthesis, properties, and applications

KH Kim, J Nam, J Choi, M Seo, J Bang - Polymer Chemistry, 2022 - pubs.rsc.org
Bottlebrush polymers (BBPs) are a type of comb-like macromolecule with densely grafted
polymeric sidechains attached to the polymer backbones, and many intriguing properties …

Directed self-assembly of block copolymers for sub-10 nm fabrication

Y Chen, S Xiong - International Journal of Extreme Manufacturing, 2020 - iopscience.iop.org
Directed self-assembly (DSA) emerges as one of the most promising new patterning
techniques for single digit miniaturization and next generation lithography. DSA achieves …

Self-assembly of an ultrahigh-χ block copolymer with versatile etch selectivity

K Azuma, J Sun, Y Choo, Y Rokhlenko… - …, 2018 - ACS Publications
We report the successful synthesis of previously inaccessible poly (3-hydroxystyrene)-block-
poly (dimethylsiloxane)(P3HS-b-PDMS) block copolymers (BCPs) with varying volume …

Light‐Mediated Polymerization Catalyzed by Carbon Nanomaterials

X Luo, Y Zhai, P Wang, B Tian, S Liu… - Angewandte Chemie …, 2024 - Wiley Online Library
Carbon nanomaterials, specifically carbon dots and carbon nitrides, play a crucial role as
heterogeneous photoinitiators in both radical and cationic polymerization processes. These …

Synthesis of a fluoromethacrylate hydroxystyrene block copolymer capable of rapidly forming sub-5 nm domains at low temperatures

C Wang, X Li, H Deng - ACS Macro Letters, 2019 - ACS Publications
A series of poly (pentadecafluorooctyl methacrylate)-block-polyhydroxystyrene (PPDFMA-b-
PHS) block copolymers (BCPs) were synthesized via reversible addition–fragmentation …