Electrical characterization of 2D materials-based field-effect transistors

SB Mitta, MS Choi, A Nipane, F Ali, C Kim… - 2D …, 2020 - iopscience.iop.org
Abstract Two-dimensional (2D) materials hold great promise for future nanoelectronics as
conventional semiconductor technologies face serious limitations in performance and power …

Probing charge traps at the 2D semiconductor/dielectric interface

JW John, A Mishra, R Debbarma, I Verzhbitskiy… - Nanoscale, 2023 - pubs.rsc.org
The family of 2-dimensional (2D) semiconductors is a subject of intensive scientific research
due to their potential in next-generation electronics. While offering many unique properties …

Emerging van der Waals Dielectrics of Inorganic Molecular Crystals for 2D Electronics

L Liu, K Liu, T Zhai - ACS nano, 2024 - ACS Publications
In the landscape of continuous downscaling metal-oxide-semiconductor field-effect
transistors, two-dimensional (2D) semiconductors with atomic thinness emerge as promising …

Imaging Fermi-level hysteresis in nanoscale bubbles of few-layer MoS2

D Jeon, H Kim, M Gu, T Kim - Communications Materials, 2023 - nature.com
The electrical stability and reliability of two-dimensional (2D) crystal-based devices are
mainly determined by charge traps in the device defects. Although nanobubble structures as …

Few-Layered MoS2 Field-Effect Transistors with a Vertical Channel of Sub-10 nm

X Zou, L Liu, J Xu, H Wang… - ACS applied materials & …, 2020 - ACS Publications
Few-layered molybdenum disulfide (MoS2) has demonstrated promising advantages for the
integration of next-generation electronic devices. A vertical short-channel MoS2 transistor …

Impact of interface traps in floating-gate memory based on monolayer MoS

G Giusi, GM Marega, A Kis… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Two-dimensional materials (2DMs) have found potential applications in many areas of
electronics, such as sensing, memory systems, optoelectronics, and power. Despite an …

Interface and Border Traps in the Gate Stack of Carbon Nanotube Film Transistors with an Yttria Dielectric

H Xiao, Y Liu, S Ding, Y Gao, M Zhai… - ACS Applied …, 2023 - ACS Publications
Measurement and optimization of interface states in metal oxide semiconductors are the
premise of building high-performance and high-reliability field-effect transistors (FETs) …

Improved Thermal Dissipation in a MoS2 Field-Effect Transistor by Hybrid High-k Dielectric Layers

J Huang, Y Li, X Yu, Z Liu, F Wang, Y Yue… - … Applied Materials & …, 2024 - ACS Publications
Transition metal dichalcogenides like MoS2 have been considered as crucial channel
materials beyond silicon to continuously advance transistor scaling down owing to their two …

Enhancing dielectric passivation on monolayer WS2 via a sacrificial graphene oxide seeding layer

PJ Wyndaele, JF De Marneffe, S Sergeant… - npj 2D Materials and …, 2024 - nature.com
The full utilization of two-dimensional transition metal dichalcogenides (2D TMDCs) faces
several challenges, among which is realizing uniform material deposition on the 2D surface …

The role of interface trap states in MoS2-FET performance: A full quantum mechanical simulation study

A Rawat, B Rawat - IEEE Transactions on Electron Devices, 2023 - ieeexplore.ieee.org
As the fabrication of short-channel MoS2-FET has made significant progress, there is a
growing need to understand the factors affecting the transfer characteristics for overcoming …