Polishing of diamond, SiC, GaN based on the oxidation modification of hydroxyl radical: status, challenges and strategies
D Shi, W Zhou, T Zhao - Materials Science in Semiconductor Processing, 2023 - Elsevier
As the wide band-gap semiconductor materials, single crystal diamond, SiC, GaN are the
key in semiconductor fields. Due to the high hardness, high brittleness and strong chemical …
key in semiconductor fields. Due to the high hardness, high brittleness and strong chemical …
Doping strategy on properties and chemical mechanical polishing performance of CeO2 Abrasives: A DFT assisted experimental study
J Ma, N Xu, J Hu, Y Luo, Y Lin, Y Pu - Applied Surface Science, 2023 - Elsevier
A series of Ce 1-x M x O 2 abrasives with different types and amounts of doping were
prepared by molten salt method. The properties of abrasives were characterized in detail by …
prepared by molten salt method. The properties of abrasives were characterized in detail by …
Study on the atomic removal behavior and damage formation mechanism of nano cutting copper–nickel alloy with diamond tool
Y He, Z Gao, M Tang, X Gao, L Fan… - Modelling and Simulation …, 2024 - iopscience.iop.org
The effects of tool rake angle and cutting depth on cutting temperature, cutting force, friction
coefficient of rake tool face, atomic accumulation of chip flow and removal, surface quality …
coefficient of rake tool face, atomic accumulation of chip flow and removal, surface quality …
Adhesion, friction and tribochemical reactions at the diamond–silica interface
Diamond-based coatings are employed in several technological applications, for their
outstanding mechanical properties, biocompatibility, and chemical stability. Of significant …
outstanding mechanical properties, biocompatibility, and chemical stability. Of significant …
Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted …
Z Kou, C Wang, W Zhou, A Chen, Y Chen - Applied Surface Science, 2024 - Elsevier
Abstract Ceria (CeO 2)-based abrasives are widely utilized in ultra-precision grinding and
chemical mechanical polishing (CMP) applications over silica materials due to their unique …
chemical mechanical polishing (CMP) applications over silica materials due to their unique …
Nanotribological Properties of Oxidized Diamond/Silica Interfaces: Insights into the Atomistic Mechanisms of Wear and Friction by Ab Initio Molecular Dynamics …
Controlling friction and wear at silica–diamond interfaces is crucial for their relevant
applications in tribology such as micro-electromechanical systems and atomic force …
applications in tribology such as micro-electromechanical systems and atomic force …
Tribological behavior of single crystal diamond based on UV photocatalytic reaction
W Liu, Q Xiong, J Lu, X Wang, Q Yan - Tribology International, 2022 - Elsevier
The tribological behaviors of single crystal diamond (SCD) under different UV photocatalytic
conditions (UV intensity, H 2 O 2 content, pH) were investigated by ball-on-disk rotating …
conditions (UV intensity, H 2 O 2 content, pH) were investigated by ball-on-disk rotating …
Study on incompatible mechanism in chemical mechanical polishing of the novel graphite/diamond composite
J Chen, Z Lin, T Jin, B Liu, A Nie - Applied Surface Science, 2023 - Elsevier
The novel graphite/diamond composite (Gradia) possesses semiconducting instinct
characteristics with controllable resistivity. Surface finishing plays a crucial role in using …
characteristics with controllable resistivity. Surface finishing plays a crucial role in using …
Atomistic wear mechanisms in diamond: effects of surface orientation, stress, and interaction with adsorbed molecules
Despite its unrivaled hardness, diamond can be severely worn during the interaction with
others, even softer materials. In this work, we calculate from first-principles the energy and …
others, even softer materials. In this work, we calculate from first-principles the energy and …
Investigation on influence of polishing disc materials in UV-catalytic polishing of single crystal diamond
W Liu, J Lu, Q Xiong, X Wang, Q Yan - Diamond and Related Materials, 2024 - Elsevier
The effects of three materials (Fe, SiO 2, Al 2 O 3) on the tribological behavior and material
removal process of single crystal diamond (SCD) in a UV-catalyzed environment were …
removal process of single crystal diamond (SCD) in a UV-catalyzed environment were …