This article reviews the process-structure-property relationship in doped ZnO thin films via
atomic layer deposition (ALD). ALD is an important manufacturing-scalable, layer-by-layer …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

Despite the high power conversion efficiency (PCE) of perovskite solar cells (PSCs), poor
long‐term stability is one of the main obstacles preventing their commercialization. Several …

The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by
atomic layer deposition technique is reported in this work. With the increasing Al doping …

Abstract Deposition of Al-doped ZnO (AZO) and Al/F co-doped ZnO (FAZO) thin films in an
ALD “batch-type” reactor at temperature of 200° C was presented. AZO films with various Al …

The effects of growth temperature on the microstructure, transport and optoelectronic
properties of a series of Al-doped ZnO (AZO) films with thickness of∼ 30 nm deposited on …

The present work highlights the low temperature deposition of Al-doped ZnO (AZO) thin films
by atomic layer deposition (ALD). The effects of Al doping concentration and substrate …

Aluminum-doped zinc oxide (AZO) films were coated on the surface of Li 4 Ti 5 O 12 (LTO)
particles via atomic layer deposition (ALD) in a fluidized bed reactor. The electrochemical …

In this work, zinc oxide (ZnO) and aluminum-doped ZnO (AZO) thin films with varying Al
contents were grown via atomic layer deposition on Si and glass substrates. The structural …

In the quest for the replacement of indium tin oxide (ITO), Ti-doped zinc oxide (TZO) films
have been synthesized by atomic layer deposition (ALD) and applied as an n-type …