[PDF][PDF] Research on Optimization of Extreme Ultraviolet Spectrum from Laser-Produced Tin Plasma
H Wang, Y Dou, Z Li, Z Xie, X Song, J Lin - 2020 - pdf.hanspub.org
Extreme ultraviolet (EUV) source of laser-produced plasma is of great significance for the
manufacturing of nanometer scale in integrated circuit. The optimization of laser-produced …
manufacturing of nanometer scale in integrated circuit. The optimization of laser-produced …