High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

In this paper, we overview the recent progress we made in the magnetron sputtering-based
developments of nano-sculpted thin films intended for energy-related applications such as …

High-power pulsed magnetron discharges have drawn an increasing interest as an
approach to produce highly ionized metallic vapor. In this paper we propose to study how …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

Aluminium nitride (AlN) films were deposited by dc magnetron sputtering (dcMS) and high
power impulse magnetron sputtering (HiPIMS) on (100) oriented silicon (Si) substrates, in Ar …

High power impulse magnetron sputtering (HiPIMS) is an ionized physical vapor deposition
technique, providing a high flux of metal ions to the substrate. However, one of the …

In this work, aluminium nitride (AlN) films were deposited on silicon substrates buffered by
an epitaxial AlN thin film for surface acoustic wave (SAW) applications. The films were …

Non equilibrium plasmas such as glow discharges have become a commonly used tool in
direct surface and interface analysis of solid materials. The application of pulsed glow …

SiN x and SiC x N y coatings were fabricated with high power impulse magnetron sputtering
(HiPIMS). The coatings microstructure, growth pattern, surface morphology, composition …

Transporting metallic ions from the magnetron cathode to the substrate is essential for an
efficient thin-film deposition process. This letter examines how inductively coupled plasma …