In the past 2 years major advances have been made in the understanding of silane–
hydrogen plasmas. In particular, the control of the formation of clusters and even crystallites …

We review current models and propose new approaches for the production of silicon thin
films by low temperature plasma processes. Growth models have often been borrowed from …

The role of ions on the growth of microcrystalline silicon films produced by the standard
hydrogen dilution of silane in a radio frequency glow discharge is studied through the …

Polymorphous silicon is a nanostructured thin film consisting of a small fraction of
nanocrystalline silicon particles and/or clusters embedded in a relaxed amorphous matrix …

In a pure-hydrogen glow discharge plasma, the etch rate of silicon increases with increasing
temperature up to about≥ 1100 Å/s at 60–80 C and, upon a further increase of the …

The active matrix display industry is rapidly presented. The most challenging aspect for
plasma source design lies in the substrate size which is now entering the 1–2 m range. This …

Powder formation in silane plasmas has been considered as a technology drawback
because it might lead to the formation of macroscopic defects in the deposited layers. Here …

The present work deals with the optimization of nano-crystalline silicon films at a low
substrate temperature, using planar inductively coupled low pressure plasma CVD. The …

Indium was used as a catalyst for the synthesis of silicon nanowires in a plasma enhanced
chemical vapor deposition reactor. In order to foster the catalytic activity of indium, the …

In capacitive hydrogen diluted silane discharges the formation of dust affects plasma
processes used, eg for thin film solar cell manufacturing. Thus, a basic understanding of the …