Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

We report on DNA translocations through nanopores created in graphene membranes.
Devices consist of 1− 5 nm thick graphene membranes with electron-beam sculpted …

(56) References Cited A method for growing films for use in integrated circuits using atomic
layer deposition and a subsequent converting US PATENT DOCUMENTS step is described …

Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, doping …

Within its rich phase diagram titanium dioxide is a truly multifunctional material with a
property palette that has been shown to span from dielectric to transparent-conducting …

Self-cleaning coatings, with benefits to environment, energy and labor saving, have attracted
great attention due to their potential application in many aspects of human's daily life. In this …

The recent progress in the metal‐insulator‐metal (MIM) capacitor technology is reviewed in
terms of the materials and processes mostly for dynamic random access memory (DRAM) …

TiO 2 films were grown on silicon substrates by atomic layer deposition (ALD) using tetrakis-
dimethylamino titanium and ozone. Amorphous TiO 2 film was deposited at a low substrate …

Titanium dioxide thin films were grown by atomic layer deposition (ALD) at 200–400° C from
a new titanium precursor, titanium tetramethoxide, and water. As compared with other …