ABSTRACT Aluminum oxide (Al2O3) is an emerging material in integrated photonics. It
exhibits a very broad transparency window from the UV to the mid-IR, very low propagation …

In this study, combinatorial atomic layer deposition (C-ALD) has been used to deposit
layered ZnO and TiO2 nanolaminates on both oxide-covered Si (100) wafers and glass …

Ordered anodic porous alumina with controlled-size holes on the order of a single-
nanometer scale was obtained by the atomic layer deposition (ALD) of Al2O3 or TiO2. The …

This is a report of a study of the nonlinear optical properties of samples based on multiple
Al_2O_3/ZnO bilayers fabricated by atomic layer deposition (ALD) in silica. The multi-layer …

The structure and composition of nanocomposites constitute design parameters that can be
manipulated to get control over their linear and nonlinear optical response. In this work, we …

Ultrathin nanolaminate structures were prepared by sequential HfO 2: Y 2 O 3 (HY) bilayer
deposition at 250° C on n-type (100) silicon wafers via thermal atomic layer deposition …

Atomic layer deposition (ALD) is a conformal, homogeneous and uniform technique, ideal
characteristics for optical waveguides. Recent investigations prove that the advantages of …

An ultrathin composite films with alternated layers containing anionic lithium tetracarboxyl
indium phthalocyanine chloride (ClInPc (COOLi) 4) and cationic poly (diallydimethyl …

An ultrathin multilayer film with well-defined structure containing anionic Poly [[4, 4-bis (4-
sulphobutyl)-4H-cyclopenta [2, 1-b: 3, 4-b'] dithiophene-2, 6-diyl]-1, 4-phenylene sodium sa …

In this work we design and fabricate from n (λ) and k (λ) experimental data for both Al 2 O 3
and TiO 2 single layer materials, an optical coating as “dielectric-mirror” following the non …