Single and dual strained channel analysis of vertical strained—SiGe impact ionization MOSFET (VESIMOS)

I Saad, CB Seng, HM Zuhir, B Nurmin… - RSM 2013 IEEE …, 2013 - ieeexplore.ieee.org
Single Channel (SC) and Dual Channel (DC) Vertical Strained-SiGe Impact Ionization
MOSFET (VESIMOS) has been successfully simulated and analyzed in this paper. Found …

Breakdown Voltage Reduction Analysis with Adopting Dual Channel Vertical Strained SiGe Impact Ionization MOSFET (VESIMOS).

I Saad, C Bun Seng, H Mohd Zuhir… - … Systems, Science & …, 2014 - search.ebscohost.com
Abstract The Single and Dual Strained SiGe layer for Vertical Strained Silicon Germanium
(SiGe) Impact Ionization MOSFET (VESIMOS) have been successfully analyzed in this …

Impact of strain and DP position on the performance of Vertical Strained-SiGe Impact Ionization MOSFET incorporating dielectric pocket (VESIMOS-DP)

I Saad, HM Zuhir, CB Seng, ARA Bakar… - … Conference of IEEE …, 2013 - ieeexplore.ieee.org
The Vertical Strained Silicon Germanium (SiGe) Impact Ionization MOSFET with Dielectric
Pocket (VESIMOS-DP) has been successfully developed and analyzed in this paper. The …

The vertical strained impact ionization MOSFET (VESIMOS) for ultra-sensitive biosensor application

I Saad, BA Hazwani, HM Zuhir… - 2015 IEEE Regional …, 2015 - ieeexplore.ieee.org
This paper venture into prospective ideas of finding the best feasible candidates for future
bio-based sensor by exploring an emerging device structure with elevated performance and …

Performance analysis of single and dual channel vertical strained SiGe impact ionization MOSFET (VESIMOS)

I Saad, B Seng, Z Hamzah, N Bolong… - 2013 IEEE Student …, 2013 - ieeexplore.ieee.org
In this work, single and dual channel SiGe layer for Vertical Strained Silicon Germanium
(SiGe) Impact Ionization MOSFET (VESIMOS) has been successfully analyzed. Presence of …

Mitigating Breakdown Voltage with Dual Channel Vertical Strained SiGe Impact Ionization MOSFET (VESIMOS)

I Saad, B Seng, Z Hamzah, N Bolong… - 2013 1st …, 2013 - ieeexplore.ieee.org
The Single and Dual Strained SiGe layer for Vertical Strained Silicon Germanium (SiGe)
Impact Ionization MOSFET (VESIMOS) have been successfully analyzed in this paper. It is …

Equivalent circuit modeling of dual channel vertical strained SiGe impact ionization MOSFET (DC-VESIMOS)

I Saad, SBA Hazwani, SC Bun… - 2015 IEEE Student …, 2015 - ieeexplore.ieee.org
The dual channel of VESIMOS (DC-VESIMOS) have been analyzed using the Silvaco TCAD
tools whereas the equivalent circuit modeling of DC-VESIMOS have been analyzed using …

Physics-based modelling of vertical strained impact ionization MOSFET (VESIMOS)

I Saad, CB Seng, HM Zuhir… - 2015 IEEE Regional …, 2015 - ieeexplore.ieee.org
CMOS device scaling faces several fundamental limits as it scaled beyond the sub-30nm
regime. Non-scalability of the subthreshold slope (S) and adverse short channel effects …

Effect of the Ge Mole Fraction on the Electrical Characteristics of Single and Dual Channel Vertical Strained SiGe Impact Ionization MOSFET (VESIMOS)

S Ismail, C Bun Seng, H Mohd Zuhir… - Advanced Materials …, 2015 - Trans Tech Publ
The effect of the Ge mole fraction in a Si1-xGex on single and dual channel Vertical Strained
SiGe Impact Ionization MOSFET was successfully analyzed. It is found that the threshold …

The effects of drain scatterings on the electron transport properties of strained-Si diodes with ballistic and non-ballistic channels

G Yasenjan, G Mamtimin, M Mamatrishat… - Journal of …, 2015 - iopscience.iop.org
The effects of multiple scattering on the electron transport properties in drain regions are
numerically investigated for the cases of strained-Si diodes with or without scattering in the …