Recent progress in simple and cost‐effective top‐down lithography for≈ 10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography
The development of a simple and cost‐effective method for fabricating≈ 10 nm scale
nanopatterns over large areas is an important issue, owing to the performance …
nanopatterns over large areas is an important issue, owing to the performance …
Designs and processes toward high-aspect-ratio nanostructures at the deep nanoscale: unconventional nanolithography and its applications
The patterning of high-resolution-featured deep-nanoscale structures with a high aspect
ratio (AR) has received increasing attention in recent years as a promising technique for a …
ratio (AR) has received increasing attention in recent years as a promising technique for a …
Highly periodic metal dichalcogenide nanostructures with complex shapes, high resolution, and high aspect ratios
The development of high resolution, high aspect ratio metal dichalcogenide nanostructures
is one of the most important issues in 2D material researchers due to the potential to exploit …
is one of the most important issues in 2D material researchers due to the potential to exploit …
universal Nanopatterning technique combining secondary sputtering with nanoscale electroplating for fabricating size-controllable ultrahigh-resolution nanostructures
Here, we describe a next-generation lithographic technique for fabricating ultrahigh-
resolution nanostructures. This technique makes use of the secondary sputtering …
resolution nanostructures. This technique makes use of the secondary sputtering …