The disclosure provides a polarization-influencing optical arrangement that includes a first
retardation element and a second retardation element. The optical arrangement is …

The invention relates to an illumination system of a micro lithographic projection exposure
apparatus comprising (a) a plurality of channels, each channel guiding a partial beam and at …

The illumination optical system for illuminating an illumi nation target surface with light from
a light source is provided with a polarization converting member which converts a …

The illumination optical system for illuminating an illumi nation target surface with light from
a light source is provided with a polarization converting member which converts a …

According to an embodiment, the illumination optical system for illuminating an illumination
target Surface with light from a light source is provided with a polarization converting mem …

The illumination optical system for illuminating an illumination target surface with light from a
light source is provided with a polarization converting member which converts a polarization …