Vertical field-effect-transistors having a silicon oxide layer with controlled thickness

C Liu, S Mehta, L Meli, M Sankarapandian… - US Patent …, 2019 - Google Patents
(21) Appl. No.: 15/726, 525 (22) Filed: Oct. 6, 2017 (57) ABSTRACT A vertical field-effect
transistor and a method for fabricating the same. The vertical field-effect transistor includes a …

Directed self-assembly composition for pattern formation and pattern-forming method

S Minegishi, Y Namie, T Nagai - US Patent 9,718,950, 2017 - Google Patents
A directed self-assembly composition for pattern formation, includes two or more kinds of
polymers. The two or more kinds of polymers each do not have a silicon atom in a main …

Directed self-assembling composition for pattern formation, and pattern-forming method

Y Namie, S Minegishi, T Nagai, T Sone - US Patent 9,684,235, 2017 - Google Patents
(57) ABSTRACT A directed self-assembling composition for pattern forma tion includes a
block copolymer. The block copolymer includes a polystyrene block having a styrene unit …

Vertical field-effect-transistors having a silicon oxide layer with controlled thickness

C Liu, S Mehta, L Meli, M Sankarapandian… - US Patent …, 2020 - Google Patents
(57) ABSTRACT A vertical field-effect transistor and a method for fabricating the same. The
vertical field-effect transistor includes a substrate and a bottom source/drain region. The …

Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography

E Peeters, WSMM Ketelaars, SF Wuister… - US Patent …, 2016 - Google Patents
(57) ABSTRACT A method of forming a patterned chemical epitaxy template, for orientation
of a self-assemblable block copolymer includ ing first and second polymer blocks, on a …

Undercut control in isotropic wet etch processes

C Liu, M Sankarapandian, K Schmidt… - US Patent …, 2019 - Google Patents
A method for manufacturing a semiconductor device includes forming a first nanosheet
device and forming a second nanosheet device spaced apart from the first nanosheet device …

Methods of patterning block copolymer layers and patterned structures

HD Koh, MJ Kim, IT Han - US Patent 9,417,520, 2016 - Google Patents
(57) ABSTRACT A method of patterning a block copolymer layer, the method including:
providing a Substrate including a topographic pattern on a Surface of the Substrate, wherein …

Compositions for controlled assembly and improved ordering of silicon-containing block copolymers

D Montarnal, CJ Hawker, EJ Kramer… - US Patent …, 2015 - Google Patents
The invention provides compositions and methods for induc ing and enhancing order and
nanostructures in organosilicon block copolymers compositions by including certain organic …

Block copolymer-based mask structures for the growth of nanopatterned polymer brushes

P Gopalan, DP Sweat, M Kim, E Han - US Patent 9,097,979, 2015 - Google Patents
8,362,179 B2 1/2013 Gopalan et al. 2006/0258826 A1 1 1/2006 Matyjaszewski et al.
2008/0045686 A1 2/2008 Meagher et al. 2009/0111703 A1 4/2009 Gopalan 2010.0036055 …

Electrical component with random electrical characteristic

L Shifren, V Chandra, M Bhargava - US Patent 9,715,965, 2017 - Google Patents
BACKGROUND This disclosure relates to the field of electrical compo nents. More
particularly, this disclosure relates to electrical components to provide a random electrical …