Vertical field-effect-transistors having a silicon oxide layer with controlled thickness
C Liu, S Mehta, L Meli, M Sankarapandian… - US Patent …, 2019 - Google Patents
(21) Appl. No.: 15/726, 525 (22) Filed: Oct. 6, 2017 (57) ABSTRACT A vertical field-effect
transistor and a method for fabricating the same. The vertical field-effect transistor includes a …
transistor and a method for fabricating the same. The vertical field-effect transistor includes a …
Directed self-assembly composition for pattern formation and pattern-forming method
S Minegishi, Y Namie, T Nagai - US Patent 9,718,950, 2017 - Google Patents
A directed self-assembly composition for pattern formation, includes two or more kinds of
polymers. The two or more kinds of polymers each do not have a silicon atom in a main …
polymers. The two or more kinds of polymers each do not have a silicon atom in a main …
Directed self-assembling composition for pattern formation, and pattern-forming method
Y Namie, S Minegishi, T Nagai, T Sone - US Patent 9,684,235, 2017 - Google Patents
(57) ABSTRACT A directed self-assembling composition for pattern forma tion includes a
block copolymer. The block copolymer includes a polystyrene block having a styrene unit …
block copolymer. The block copolymer includes a polystyrene block having a styrene unit …
Vertical field-effect-transistors having a silicon oxide layer with controlled thickness
C Liu, S Mehta, L Meli, M Sankarapandian… - US Patent …, 2020 - Google Patents
(57) ABSTRACT A vertical field-effect transistor and a method for fabricating the same. The
vertical field-effect transistor includes a substrate and a bottom source/drain region. The …
vertical field-effect transistor includes a substrate and a bottom source/drain region. The …
Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography
E Peeters, WSMM Ketelaars, SF Wuister… - US Patent …, 2016 - Google Patents
(57) ABSTRACT A method of forming a patterned chemical epitaxy template, for orientation
of a self-assemblable block copolymer includ ing first and second polymer blocks, on a …
of a self-assemblable block copolymer includ ing first and second polymer blocks, on a …
Undercut control in isotropic wet etch processes
A method for manufacturing a semiconductor device includes forming a first nanosheet
device and forming a second nanosheet device spaced apart from the first nanosheet device …
device and forming a second nanosheet device spaced apart from the first nanosheet device …
Methods of patterning block copolymer layers and patterned structures
HD Koh, MJ Kim, IT Han - US Patent 9,417,520, 2016 - Google Patents
(57) ABSTRACT A method of patterning a block copolymer layer, the method including:
providing a Substrate including a topographic pattern on a Surface of the Substrate, wherein …
providing a Substrate including a topographic pattern on a Surface of the Substrate, wherein …
Compositions for controlled assembly and improved ordering of silicon-containing block copolymers
D Montarnal, CJ Hawker, EJ Kramer… - US Patent …, 2015 - Google Patents
The invention provides compositions and methods for induc ing and enhancing order and
nanostructures in organosilicon block copolymers compositions by including certain organic …
nanostructures in organosilicon block copolymers compositions by including certain organic …
Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
8,362,179 B2 1/2013 Gopalan et al. 2006/0258826 A1 1 1/2006 Matyjaszewski et al.
2008/0045686 A1 2/2008 Meagher et al. 2009/0111703 A1 4/2009 Gopalan 2010.0036055 …
2008/0045686 A1 2/2008 Meagher et al. 2009/0111703 A1 4/2009 Gopalan 2010.0036055 …
Electrical component with random electrical characteristic
BACKGROUND This disclosure relates to the field of electrical compo nents. More
particularly, this disclosure relates to electrical components to provide a random electrical …
particularly, this disclosure relates to electrical components to provide a random electrical …