A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub‐10 nm Microdomains in Si‐Containing Block Copolymer Thin Films
Achieving sub‐10 nm high‐aspect‐ratio patterns from diblock copolymer self‐assembly
requires both a high interaction parameter (χ, which is determined by the incompatibility …
requires both a high interaction parameter (χ, which is determined by the incompatibility …
Directed self-assembly of silicon-containing block copolymer thin films
The directed self-assembly (DSA) of lamella-forming poly (styrene-block-
trimethylsilylstyrene)(PS–PTMSS, L 0= 22 nm) was achieved using a combination of tailored …
trimethylsilylstyrene)(PS–PTMSS, L 0= 22 nm) was achieved using a combination of tailored …
A Study of Tin-containing Block Copolymers
1Department of Chemistry, The University of Texas, Austin, Texas 78712 2McKetta
Department of Chemical Engineering, The University of Texas, Austin, TX 78712 3Lam …
Department of Chemical Engineering, The University of Texas, Austin, TX 78712 3Lam …
The Photopolymer Science and Technology Award
DW Janes, T Inoue, BD McCoy, I Madan… - Journal of …, 2015 - jstage.jst.go.jp
Dustin W. Janes obtained a BS Degree from Tulane University and a Ph. D. Degree from
Columbia University, both in Chemical Engineering. For his dissertation, under the direction …
Columbia University, both in Chemical Engineering. For his dissertation, under the direction …